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Publications (7/7 displayed)
- 2023Investigating the Molecular Orientation and Thermal Stability of Spiro‐OMeTAD and its Dopants by Near Edge X‐Ray Absorption Fine Structurecitations
- 2019H2O2-assisted photoelectrocatalytic degradation of Mitoxantrone using CuO nanostructured films: Identification of by-products and toxicitycitations
- 2019Characterisation of Electroless Deposited Cobalt by Hard and Soft X-ray Photoemission Spectroscopy
- 2019H2O2-assisted photoelectrocatalytic degradation of Mitoxantrone using CuO nanostructured filmscitations
- 2018Photoemission studies on the efficacy of self-assembled monolayers (SAMs) for use in transistor interconnect applications
- 2018Nucleation and adhesion of ultra-thin copper films on amino-terminated self-assembled monolayerscitations
- 2016Chemical and electrical characterisation of the segregation of Al from a CuAl alloy (90%:10% wt) with thermal annealcitations
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document
Characterisation of Electroless Deposited Cobalt by Hard and Soft X-ray Photoemission Spectroscopy
Abstract
<p>Electroless deposited (ELD) cobalt with palladium as a catalyst, and an underlying self-assembled monolayer (SAM) was investigated for potential use in advanced complementary metal oxide semiconductor (CMOS) applications using both hard (HAXPES) and soft (XPS) x-ray photoelectron spectroscopy. HAXPES spectra established the uniformity of the deposited Co film and the nature of the buried Co-Si interface 20nm below the surface. The Pd is seen to diffuse through the Co following thermal annealing. While the deposited Co film is predominantly metallic, Co-silicide forms at the Co-Si interface upon deposition and decomposes with thermal anneal up to 500°C.</p>