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Dziurdzia, Barbara
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Characterization of thick-film dielectric at microwave frequencies
Abstract
In this paper results of accurate measurements of relative permittivity and dielectric loss tangent of photoimageable dielectric Fodel 6050 has been presented. The measurement method uses a split-post dielectric resonator and enables characterisation of dielectric properties of planar thick-film layers deposited on low loss dielectric substrates. Measurements have been performed on two Fodel films deposited on alumina and sapphire substrates employing two split post dielectric resonators at frequencies 19.3 GHz and 19.9 GHz.