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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Silva, Dilusha
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Publications (4/4 displayed)
- 2018Effect of thermal annealing on stress relaxation and crystallisation of ion beam sputtered amorphous Si1-xGex thin filmscitations
- 2017Large-Area MEMS Tunable Fabry-Perot Filters for Multi/Hyperspectral Infrared Imagingcitations
- 2016Investigation of Thermal Expansion Effects on Si-Based MEMS Structurescitations
- 2014Characterization of mechanical, optical and structural properties of bismuth oxide thin films as a write-once medium for blue laser recordingcitations
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article
Investigation of Thermal Expansion Effects on Si-Based MEMS Structures
Abstract
© 1992-2012 IEEE.This paper presents a study of the effects of stress and thermal expansion of inductively coupled plasma enhanced chemical vapor deposited (ICPCVD) amorphous Si thin films on low-temperature microelectromechanical systems test structures. Experimental data were used in conjunction with finite-element modeling (FEM) to predict deformation in simple microstructures across a wide temperature range from 85 to 300 K. Temperature dependence of residual stress and the coefficient of thermal expansion (CTE) of ICPCVD Si thin films was investigated by characterizing the curvature of bilayer thin-film samples through the use of optical profilometry at low temperature. Extracted parameters were used in an FEM package to confirm the experimental results by correlating with observed deformation of fabricated test structures. It is demonstrated that the experimentally determined CTE enables accurate modeling of the mechanical behavior of thin-film microstructures across a wide range of temperatures. [2015-0175]