| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Healy, N.
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (16/16 displayed)
- 2015Kerr nonlinear switching in a hybrid silicasilicon microspherical resonatorcitations
- 2015Templated growth of II-VI semiconductor optical fiber devices and steps towards infrared fiber lasers
- 2015Fiber-based semiconductor resonators for nonlinear photonics
- 2014Long-wavelength silicon photonic integrated circuits
- 2014Long-wavelength silicon photonic integrated circuits
- 2014Locally erasable couplers for optical device testing in silicon on insulatorcitations
- 2014Annealing of amorphous silicon using c.w. visible lasers
- 2014Tunable anisotropic strain in laser crystallized silicon core optical fibers
- 2013Laser crystallisation of semiconductor core optical fibres
- 2013Laser crystallisation of semiconductor core optical fibres
- 2012Laser annealing of amorphous silicon core optical fiberscitations
- 2012Mid Infrared Transmistion Properties of ZnSe Microstructured Optical Fiberscitations
- 2011High index contrast semiconductor ARROW and hybrid ARROW fiberscitations
- 2011Selective semiconductor filling of microstructured optical fiberscitations
- 2011ARROW guiding silicon photonic crystal fibres
- 2010Integration of semiconductors molecules and metals into microstructured optical fibers
Places of action
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article
Locally erasable couplers for optical device testing in silicon on insulator
Abstract
Wafer scale testing is critical to reducing production costs and increasing production yield. Here we report a method that allows testing of individual optical components within a complex optical integrated circuit. The method is based on diffractive grating couplers, fabricated using lattice damage induced by ion implantation of germanium. These gratings can be erased via localised laser annealing, which is shown to reduce the outcoupling efficiency by over 20 dB after the device testing is completed. Laser annealing was achieved by employing a CW laser, operating at visible wavelengths thus reducing equipment costs and allowing annealing through thick oxide claddings. The process used also retains CMOS compatibility.