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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Kyritsakis, Andreas
University of Tartu
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (10/10 displayed)
- 2024Polarization characteristics and structural modifications of Cu nanoparticles under high electric fields
- 2023Biased self-diffusion on Cu surface due to electric field gradientscitations
- 2023Critical review on experimental and theoretical studies of elastic properties of wurtzite-structured ZnO nanowirescitations
- 2022Thermal, Mechanical, and Acoustic Properties of Polydimethylsiloxane Filled with Hollow Glass Microspherescitations
- 2022Biased self-diffusion on Cu surface due to electric field gradientscitations
- 2020Tungsten migration energy barriers for surface diffusioncitations
- 2019Ab initio calculation of field emission from metal surfaces with atomic-scale defectscitations
- 2016Atomistic modeling of metal surfaces under high electric fieldscitations
- 2016Effects of control oxide material on the charging times of metal nanoparticles inside non-volatile memories
- 2016Extension of the general thermal field equation for nanosized emitterscitations
Places of action
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document
Atomistic modeling of metal surfaces under high electric fields
Abstract
<p>We propose a novel tool to perform electrodynamics-molecular dynamics and electrodynamics-kinetic Monte Carlo simulations. The tool generates finite elements in-and outside the atomistic domain, uses them to solve a system of linear differential equations and offers the interface to output the results into atomistic simulations. The tool shows high tolerance against crystallographic orientation in the material and robustness against dynamic atomistic processes there.</p>