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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Ali, M. A. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Mitchell, Arnan
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Topics
Publications (14/14 displayed)
- 2021Fringe analysis approach for imaging surface undulations on technical surfacescitations
- 2020Optical frequency comb generation using low stress CMOS compatible reactive sputtered silicon nitride waveguidescitations
- 2020Optical frequency comb generation using low stress reactive sputtered silicon nitride waveguides
- 2019CMOS-compatible, plasma beam assisted reactive magnetron sputtered silicon nitride films for photonic integrated circuits
- 2019Post processing dispersion trimming for on-chip mid-infrared supercontinuum generation
- 2019Low stress, anomalous dispersive silicon nitride waveguides fabricated by reactive sputtering
- 2019Low loss CMOS-compatible silicon nitride photonics utilizing reactive sputtered thin filmscitations
- 2017Liquid metal enabled microfluidicscitations
- 2017Compact Brillouin devices through hybrid integration on siliconcitations
- 2015Creation of Liquid Metal 3D Microstructures Using Dielectrophoresiscitations
- 2014Spectral and angular characteristics of dielectric resonator metasurface at optical frequenciescitations
- 2013Liquid metal marblescitations
- 2013Liquid metal marblescitations
- 2013Electrochemically induced actuation of liquid metal marblescitations
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document
Low stress, anomalous dispersive silicon nitride waveguides fabricated by reactive sputtering
Abstract
<p>Silicon nitride (SiN) waveguides are a promising platform for nonlinear photonic devices, as it offers a large bandgap, low two-photon absorption, CMOS-compatible fabrication methods and a significant nonlinearity [1,2]. Prominent applications are optical frequency comb generation [2] and supercontinuum generation [3]. These applications require waveguides with an anomalous group velocity dispersion in order to be efficient, which can be achieved by tailoring the waveguide dimensions [2,3]. Optical-quality SiN films are commonly deposited by LPCVD, however the high processing temperatures (> 800 ° C) can cause a high layer stress and crack formation. In this work we investigate reactive magnetron sputtering (PVD) as a method for low temperature (< 150 °C) deposition of SiN thin-films for optical waveguides.</p>