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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Gabe, D. R.
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Publications (6/6 displayed)
- 2006Catalytic anodes for electrodepositioncitations
- 2006Use of organic reductants to lower brightener consumption in acid copper electroplating bath utilising catalytic anodescitations
- 2003Characterisation of insoluble anodes for acid copper electrodepositioncitations
- 2003The effect of insoluble anodes on the process control and deposit quality of acid copper electroplating bathscitations
- 2001Methods for achieving high speed acid copper electroplating in the PCB industrycitations
- 2001The use of insoluble anodes in acid sulphate copper electrodeposition solutionscitations
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article
Methods for achieving high speed acid copper electroplating in the PCB industry
Abstract
<p>Significant reductions in the cycle time for the desmear, "making holes conductive" and imaging stages of the printed circuit board manufacturing process have been achieved by the use of horizontal conveyorised techniques. If these savings in time are to be fully realised, it is also necessary to have a high-speed acid copper electroplating process that, by implication, must be capable of operating at very high current densities. This paper outlines the fundamental electrochemical principles of acid copper electroplating and explains how these impact on high speed electroplating in terms of the electrolyte chemistry, the construction of the plating cell and the method in which the current is delivered (i.e. DC or pulse).</p>