| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Huotari, Simo
University of Helsinki
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (10/10 displayed)
- 2024Amorphous carbon modulated-quantum dots NiO for efficient oxygen evolution in anion exchange membrane water electrolyzercitations
- 2024Highly dispersed atomic layer deposited CrOx on SiO2 catalyst with enhanced yield of propylene for CO2 –mediated oxidative dehydrogenation of propanecitations
- 2024Ambient pressure x-ray photoelectron spectroscopy study on the initial atomic layer deposition process of platinum
- 2023Effect of atomic layer deposited zinc promoter on the activity of copper-on-zirconia catalysts in the hydrogenation of carbon dioxide to methanolcitations
- 2022Highly dispersed atomic layer deposited CrOx on SiO2 catalyst with enhanced yield of propylene for CO2 –mediated oxidative dehydrogenation of propanecitations
- 2019Intercalation of Lithium Ions from Gaseous Precursors into beta-MnO2 Thin Films Deposited by Atomic Layer Depositioncitations
- 2019Intercalation of Lithium Ions from Gaseous Precursors into β-MnO 2 Thin Films Deposited by Atomic Layer Depositioncitations
- 2017Doping dependent plasmon dispersion in 2H-transition metal dichalcogenidescitations
- 2016Doping dependent plasmon dispersion in 2H-transition metal dichalcogenidescitations
- 2010Fe3+ spin transition in CaFe2O4 at high pressurecitations
Places of action
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article
Doping dependent plasmon dispersion in 2H-transition metal dichalcogenides
Abstract
<p>We report the behavior of the charge carrier plasmon of 2H-transition metal dichalcogenides (TMDs) as a function of intercalation with alkali metals. Intercalation and concurrent doping of the TMD layers have a substantial impact on plasmon energy and dispersion. While the plasmon energy shifts are related to the intercalation level as expected within a simple homogeneous electron gas picture, the plasmon dispersion changes in a peculiar manner independent of the intercalant and the TMD materials. Starting from a negative dispersion, the slope of the plasmon dispersion changes sign and grows monotonously upon doping. Quantitatively, the increase of this slope depends on the orbital character (4d or 5d) of the conduction bands, which indicates a decisive role of band structure effects on the plasmon behavior.</p>