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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Liliental-Weber, Z.
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (25/25 displayed)
- 2013Local structure of amorphous GaN1-xAsx semiconductor alloys across the composition rangecitations
- 2013Microstructure of Mg doped GaNAs alloyscitations
- 2012Wurtzite-to amorphous-to cubic phase transition of GaN1-x Asx alloys with increasing As contentcitations
- 2012Structural studies of GaN 1-x As x and GaN 1-x Bi x alloys for solar cell applicationscitations
- 2011Structural defects and cathodoluminescence of InxGa1-xN layerscitations
- 2011GaNAs alloys over the whole composition range grown on crystalline and amorphous substratescitations
- 2010Non-equilibrium GaNAs alloys with band gap ranging from 0.8-3.4 eVcitations
- 2010Molecular beam epitaxy of GaNAs alloys with high As content for potential photoanode applications in hydrogen productioncitations
- 2010Amorphous GaN1-xAsx alloys for multi-junction solar cells
- 2010Low gap amorphous GaN1-x Asx alloys grown on glass substratecitations
- 2009Structural perfection of InGaN layers and its relation to photoluminescencecitations
- 2009Highly mismatched crystalline and amorphous GaN1-x As x alloys in the whole composition rangecitations
- 2009Electrical and electrothermal transport in InNcitations
- 2009Spontaneous stratification of InGaN layers and its influence on optical propertiescitations
- 2008Energetic Beam Synthesis of Dilute Nitrides and Related Alloyscitations
- 2008Low-temperature grown compositionally graded InGaN filmscitations
- 2006Structure and electronic properties of InN and In-rich group III-nitride alloyscitations
- 2005Structural TEM study of nonpolar a-plane gallium nitride grown on (1120) 4H-SiC by organometallic vapor phase epitaxycitations
- 2005Transmission electron microscopy study of nonpolar a-plane GaN grown by pendeo-epitaxy on (11(2)under-bar0) 4H-SiC
- 2004Characterization and manipulation of exposed Ge nanocrystals
- 2003Diluted magnetic semiconductors formed by ion implantation and pulsed-laser meltingcitations
- 2003Growth and characterization of epitaxial GaN thin films on 4H-SiC (11.0) substrates
- 2003Synthesis of GaNxAs1-x thin films by pulsed laser melting and rapid thermal annealing of N+-implanted GaAscitations
- 2003Microstructure of nonpolar a-plane GaN grown on (1120) 4H-SiC investigated by TEM.
- 2002Transparent ZnO-based ohmic contact to p-GaNcitations
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article
Structural TEM study of nonpolar a-plane gallium nitride grown on (1120) 4H-SiC by organometallic vapor phase epitaxy
Abstract
<p>Conventional and high-resolution electron microscopy have been applied for studying lattice defects in nonpolar a-plane GaN grown on a 4H-SiC substrate with an AlN buffer layer. Samples in plan-view and cross-sectional configurations have been investigated. Basal and prismatic stacking faults together with Frank and Shockley partial dislocations were found to be the main defects in the GaN layers. High-resolution electron microscopy in combination with image simulation supported Drum's model for the prismatic stacking faults. The density of basal stacking faults was measured to be similar to 1.6x10(6) cm(-1). The densities of partial dislocations terminating I-1 and I-2 types of intrinsic basal stacking faults were similar to 4.0x10(10) cm(-2) and similar to 0.4x10(10) cm(-2), respectively. The energy of the I-2 stacking fault in GaN was estimated to be (40 +/- 4) erg/cm(2) based on the separation of Shockley partial dislocations.</p>