Materials Map

Discover the materials research landscape. Find experts, partners, networks.

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The Materials Map is an open tool for improving networking and interdisciplinary exchange within materials research. It enables cross-database search for cooperation and network partners and discovering of the research landscape.

The dashboard provides detailed information about the selected scientist, e.g. publications. The dashboard can be filtered and shows the relationship to co-authors in different diagrams. In addition, a link is provided to find contact information.

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Materials Map under construction

The Materials Map is still under development. In its current state, it is only based on one single data source and, thus, incomplete and contains duplicates. We are working on incorporating new open data sources like ORCID to improve the quality and the timeliness of our data. We will update Materials Map as soon as possible and kindly ask for your patience.

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693.932 PEOPLE
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Naji, M.
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Kucheyev, S. O.

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in Cooperation with on an Cooperation-Score of 37%

Topics

Publications (18/18 displayed)

  • 2007Energetic Processing of Interstellar Silicate Grains by Cosmic Rays81citations
  • 2005Ion irradiation-induced disordering of semiconductors5citations
  • 2004Ion-beam-defect processes in group-III nitrides and ZnO46citations
  • 2004Dynamic annealing in III-nitrides under ion bombardment54citations
  • 2004Lattice damage produced in GaN by swift heavy ions83citations
  • 2003Ion-beam-produced structural defects in ZnO254citations
  • 2002Electrical isolation of ZnO by ion bombardment65citations
  • 2002Ion-beam-produced damage and its stability in AlN films64citations
  • 2002Structural disorder in ion-implanted AlxGa1-xN40citations
  • 2001Effect of ion species on the accumulation of ion-beam damage in GaNcitations
  • 2001Electrical isolation of GaN by MeV ion irradiation50citations
  • 2001The effects of ion mass, energy, dose, flux and irradiation temperature on implantation disorder in GaN39citations
  • 2001Disordering and anomalous surface erosion of GaN during ion bombardment at elevated temperatures32citations
  • 2000Ion-beam-induced porosity of GaN69citations
  • 2000Polycrystallization and surface erosion of amorphous GaN during elevated temperature ion bombardment15citations
  • 2000Ion-beam-induced dissociation and bubble formation in GaN72citations
  • 2000Damage buildup in GaN under ion bombardment175citations
  • 2000Surface disordering and nitrogen loss in GaN under ion bombardmentcitations

Places of action

Chart of shared publication
Felter, T. E.
1 / 1 shared
Van Breugel, W.
1 / 1 shared
Baragiola, R. A.
1 / 1 shared
Loeffler, M. J.
1 / 1 shared
Bradley, J. P.
1 / 4 shared
Bajt, S.
1 / 3 shared
Graham, G.
1 / 2 shared
Torres, Diego F.
1 / 1 shared
Dai, Z. R.
1 / 1 shared
Dukes, C. A.
1 / 1 shared
Bringa, E. M.
1 / 4 shared
Tielens, A. G. G. M.
1 / 16 shared
Williams, J. S.
17 / 39 shared
Zou, J.
10 / 17 shared
Li, G.
11 / 31 shared
Timmers, H.
1 / 2 shared
Hamza, A. V.
1 / 4 shared
Evans, Cheryl
1 / 1 shared
Nelson, A. J.
1 / 2 shared
Inoue, Masataka
1 / 1 shared
Ogata, Ken Ichi
1 / 1 shared
Koike, Kazuto
1 / 2 shared
Deenapanray, P. N. K.
1 / 7 shared
Sasa, Shigehiko
1 / 1 shared
Yano, Mitsuaki
1 / 2 shared
Guo, S.
2 / 11 shared
Ferguson, I. T.
2 / 6 shared
Manasreh, M. O.
2 / 13 shared
Pophristic, M.
2 / 4 shared
Zou, Jin
3 / 26 shared
Jagadish, C.
3 / 23 shared
Titov, A. I.
1 / 3 shared
Boudinov, H.
1 / 3 shared
Tan, H. H.
1 / 6 shared
Phillips, M. R.
1 / 3 shared
Pearton, S. J.
1 / 3 shared
Toth, M.
1 / 3 shared
Chart of publication period
2007
2005
2004
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Co-Authors (by relevance)

  • Felter, T. E.
  • Van Breugel, W.
  • Baragiola, R. A.
  • Loeffler, M. J.
  • Bradley, J. P.
  • Bajt, S.
  • Graham, G.
  • Torres, Diego F.
  • Dai, Z. R.
  • Dukes, C. A.
  • Bringa, E. M.
  • Tielens, A. G. G. M.
  • Williams, J. S.
  • Zou, J.
  • Li, G.
  • Timmers, H.
  • Hamza, A. V.
  • Evans, Cheryl
  • Nelson, A. J.
  • Inoue, Masataka
  • Ogata, Ken Ichi
  • Koike, Kazuto
  • Deenapanray, P. N. K.
  • Sasa, Shigehiko
  • Yano, Mitsuaki
  • Guo, S.
  • Ferguson, I. T.
  • Manasreh, M. O.
  • Pophristic, M.
  • Zou, Jin
  • Jagadish, C.
  • Titov, A. I.
  • Boudinov, H.
  • Tan, H. H.
  • Phillips, M. R.
  • Pearton, S. J.
  • Toth, M.
OrganizationsLocationPeople

article

Damage buildup in GaN under ion bombardment

  • Li, G.
  • Kucheyev, S. O.
  • Williams, J. S.
  • Zou, J.
Abstract

<p>The damage buildup until amorphization in wurtzite GaN films under kev light (<sup>12</sup>C) and heavy (<sup>197</sup>Au) ion bombardment at room and liquid nitrogen (LN<sub>2</sub>) temperatures is studied by Rutherford backscattering/channeling (RBS/C) spectrometry and transmission electron microscopy (TEM). The effect of beam flux on implantation damage in GaN is reported. A marked similarity between damage buildup for light and heavy ion bombardment regimes is observed. The results point to substantial dynamic annealing of irradiation defects even during heavy ion bombardment at LN<sub>2</sub> temperature. Amorphization starts from the GaN surface with increasing ion dose for both LN<sub>2</sub> and room-temperature bombardment with light or heavy ions. A strong surface defect peak, seen by RBS/C, arises from an amorphous layer at the GaN surface, as indicated by TEM. The origin of such an amorphous layer is attributed to the trapping of mobile point defects by the GaN surface, as suggested by the flux behavior. However, in the samples implanted with light ions to low doses (1 × 10<sup>15</sup> cm<sup>-2</sup>), no amorphous layer on the GaN surface is revealed by TEM. Damage buildup is highly sigmodal for LN<sub>2</sub> temperature irradiation with light or heavy ions. Formation of planar defects in the crystal bulk is assumed to provide a "nucleation site" for amorphization with increasing ion dose during irradiation at LN<sub>2</sub> temperature. For room-temperature bombardment with heavy ions, the damage in the GaN bulk region saturates at a level lower than that of the amorphous phase, as measured by RBS/C, and amorphization proceeds from the GaN surface with increasing ion dose. For such a saturation regime at room temperature, implantation damage in the bulk consists of point-defect clusters and planar defects which are parallel to the basal plane of the GaN film. Various defect interaction processes in GaN during ion bombardment are proposed to explain the observed, somewhat unexpected behavior of disorder buildup.</p>

Topics
  • impedance spectroscopy
  • surface
  • cluster
  • amorphous
  • phase
  • Nitrogen
  • transmission electron microscopy
  • annealing
  • spectrometry
  • Rutherford backscattering spectrometry
  • point defect