Materials Map

Discover the materials research landscape. Find experts, partners, networks.

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The Materials Map is an open tool for improving networking and interdisciplinary exchange within materials research. It enables cross-database search for cooperation and network partners and discovering of the research landscape.

The dashboard provides detailed information about the selected scientist, e.g. publications. The dashboard can be filtered and shows the relationship to co-authors in different diagrams. In addition, a link is provided to find contact information.

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The Materials Map is still under development. In its current state, it is only based on one single data source and, thus, incomplete and contains duplicates. We are working on incorporating new open data sources like ORCID to improve the quality and the timeliness of our data. We will update Materials Map as soon as possible and kindly ask for your patience.

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in Cooperation with on an Cooperation-Score of 37%

Topics

Publications (1/1 displayed)

  • 2020Systematic study of shockley-read-hall and radiative recombination in GaN on Al<sub>2</sub>O<sub>3</sub>, freestanding GaN, and GaN on Si16citations

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Bayram, Can
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Liu, R.
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Schaller, Richard
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2020

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  • Bayram, Can
  • Liu, R.
  • Schaller, Richard
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article

Systematic study of shockley-read-hall and radiative recombination in GaN on Al<sub>2</sub>O<sub>3</sub>, freestanding GaN, and GaN on Si

  • Lee, Hsuan-Ping
  • Bayram, Can
  • Liu, R.
  • Schaller, Richard
Abstract

<jats:title>Abstract</jats:title><jats:p>Here we study and correlate structural, electrical, and optical properties of three GaN samples: GaN grown by metalorganic chemical vapor deposition on sapphire (GaN/Al<jats:sub>2</jats:sub>O<jats:sub>3</jats:sub>), freestanding GaN crystals grown by the high nitrogen pressure solution method (HNPS GaN), and GaN grown by hydride vapor phase epitaxy on silicon (GaN/Si). Defect and impurity densities and carrier concentrations are quantified by x-ray diffraction, secondary mass ion spectroscopy, and Hall effect studies, respectively. Power-dependent photoluminescence measurements reveal GaN near-band-edge emissions from all samples having mixtures of free exciton and band-to-band transitions. Only the defect luminescence in the GaN/Si sample remains unsaturated, in contrast to those from the HNPS GaN and GaN/Al<jats:sub>2</jats:sub>O<jats:sub>3</jats:sub> samples. Carrier lifetimes, extracted from time-resolved photoluminescence measurements, and internal quantum efficiencies, extracted from temperature-dependent photoluminescence measurements, are used to extract radiative and nonradiative lifetimes. Shockley–Read–Hall (A) and radiative recombination coefficients (B) are then calculated accordingly. Overall, the A coefficient is observed to be highly sensitive to the point defect density rather than dislocation density, as evidenced by three orders of magnitude reduction in threading dislocation density reducing the A coefficient by one order of magnitude only. The B coefficient, while comparable in the higher quality and lowly doped GaN/Al<jats:sub>2</jats:sub>O<jats:sub>3</jats:sub> and HNPS GaN samples, was severely degraded in the GaN/Si sample due to high threading dislocation density and doping concentration.</jats:p>

Topics
  • density
  • impedance spectroscopy
  • photoluminescence
  • phase
  • x-ray diffraction
  • Nitrogen
  • dislocation
  • Silicon
  • chemical vapor deposition
  • point defect
  • ion spectroscopy