| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Oladijo, O. P.
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (15/15 displayed)
- 2024Sputtering of high entropy alloys thin filmscitations
- 2023The Water Absorption and Thermal Properties of Green Pterocarpus Angolensis (Mukwa)-Polylactide Compositescitations
- 2022The mechanical properties of alkali and laccase treated pterocarpus angolensis (mukwa)-polylactic acid (PLA) compositescitations
- 2020Advances in powder-based technologies for production of high-performance sputtering targetscitations
- 2020Influence of deposition parameters on the residual stresses of WC-Wo sputtered thin films
- 2020Morphological investigation and mechanical behaviour of agrowaste reinforced aluminium alloy 8011 for service life improvementcitations
- 2020A multifractal study of al thin films prepared by rf magnetron sputteringcitations
- 2020Creep behaviour and adhesion properties of tic thin film coating grown by rf magnetron sputtering
- 2019Exploring the effect of rf power in sputtering of aluminum thin films-a microstructure analysis
- 2019Effect of processing technique on the mechanical properties of a functionalized superhydrophobic silane
- 2019Synchrotron radiation characterization of magnetron sputtered WC-Co thin films on mild steel substrate
- 2019Effect of varying low substrate temperature on sputtered aluminium filmscitations
- 2019Characterization of Hydrophobic Silane Film Deposited on AISI 304 Stainless Steel for Corrosion Protectioncitations
- 2018Atomic force microscopy analysis of surface topography of pure thin aluminum filmscitations
- 2018A review of finite element modelling of nanoindentation and micro-scratch techniques in characterizing thin films
Places of action
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article
Atomic force microscopy analysis of surface topography of pure thin aluminum films
Abstract
<p>Pure aluminium thin films were deposited on stainless and mild steel substrates through rf magnetron sputtering at rf powers of 150 and 200 W. Surface analysis of the films was undertaken using atomic force microscopy. The surface structure evolution, roughness and distribution were examined and discussed. Power spectral density, skewness and Kurtosis parameters were used to explain the nature and distribution of the surface structures on the thin aluminium films as reported from the line profile analyses. The result shows that the morphologies of the surface structures of Al thin films vary with power and substrate type. The coatings also exhibited higher roughness at the power of 200 W. A strong link exists between the atomic force microscopy (AFM) observations and scanning electron microscopy (SEM) analysis, which implies that AFM can be considerably used to study the microstructural evolution of thin films prepared by magnetron sputtering.</p>