| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Chawla, Amit Kumar
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (4/4 displayed)
- 2024The effect of sputtering parameters and doping on the properties of CrN‐based coatings—A critical reviewcitations
- 2023Impact of sputtering gas on the microstructural, mechanical and wetting properties of vanadium nitride coatingscitations
- 2023A review of mechanical and tribological properties of Ni<sub>3</sub>Al-based coatings-synthesis and high-temperature behaviorcitations
- 2022In-situ investigation on hydrogenation-dehydrogenation of Pd–Ag alloy filmscitations
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article
A review of mechanical and tribological properties of Ni<sub>3</sub>Al-based coatings-synthesis and high-temperature behavior
Abstract
<jats:title>Abstract</jats:title><jats:p>Ni-based superalloys and thin films have drawn the attention of researchers because of their extraordinary properties. In particular, Nickel Aluminides like Ni<jats:sub>3</jats:sub>Al thin films show excellent mechanical and tribological properties. They are good candidates for high-temperature applications as they show excellent corrosion and oxidation resistance properties. Several researchers have synthesized Ni<jats:sub>3</jats:sub>Al thin films via Chemical vapor deposition methods (CVD) and physical vapor deposition methods (PVD). Most of them have synthesized Ni<jats:sub>3</jats:sub>Al thin film via magnetron sputtering because of microstructural homogeneity and less contamination achieved by this process. To achieve better properties of these films, many alterations in terms of deposition parameters and doping have been experimented by researchers. This work reflects the review of work done in the area of depositing Ni<jats:sub>3</jats:sub>Al-based thin films via different techniques for high-temperature applications.</jats:p>