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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Johansson-Jöesaar, Mats P.
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Topics
Publications (8/8 displayed)
- 2023Adhesive wear of TiAlN coatings during low speed turning of stainless steel 316Lcitations
- 2023In-situ real-time evolution of intrinsic stresses and microstructure during growth of cathodic arc deposited (Al,Ti)N coatings
- 2021Crater wear mechanism of TiAlN coatings during high-speed metal turningcitations
- 2020Effect of varying N2 pressure on DC arc plasma properties and microstructure of TiAlN coatingscitations
- 2019The Effect of Cathodic Arc Guiding Magnetic Field on the Growth of (Ti0.36Al0.64)N Coatingscitations
- 2017Effects of decomposition route and microstructure on h-AlN formation rate in TiCrAlN alloyscitations
- 2015Industry-relevant magnetron sputtering and cathodic arc ultra-high vacuum deposition system for in situ x-ray diffraction studies of thin film growth using high energy synchrotron radiationcitations
- 2014High temperature phase decomposition in TixZryAlzNcitations
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article
Effect of varying N2 pressure on DC arc plasma properties and microstructure of TiAlN coatings
Abstract
<jats:title>Abstract</jats:title><jats:p>Detailed knowledge of correlations between direct current (DC) cathodic arc deposition process parameters, plasma properties, and the microstructure of deposited coatings are essential for a comprehensive understanding of the DC cathodic arc deposition process. In this study we have probed the plasma, generated by DC arc on a Ti-50 at.% Al cathode in a N<jats:sub>2</jats:sub> ambience, at the growth front of the TiAlN coating. Several consequences of an increasing N<jats:sub>2</jats:sub> pressure are observed, including a decreased electron temperature, an increased electron density, and a loss of energetic ions. As a result, the preferred growth texture switches from 220 to 111. It is also observed that neutrals in the plasma can significantly contribute to the growth of TiAlN coatings.</jats:p>