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- 2024Integration of epitaxial LiNbO3 thin films with silicon technologycitations
- 2021Asymmetry-Induced Redistribution in Sn(IV)–Ti(IV) Hetero-Bimetallic Alkoxide Precursors and Its Impact on Thin-Film Deposition by Metal–Organic Chemical Vapor Depositioncitations
- 2018Chromium carbide growth by direct liquid injection chemical vapor deposition in long and narrow tubes, experiments, modeling and simulationcitations
- 2016Thermodynamic evaluation of oxidation during brazing process of medium-voltage electrical circuit breakers
- 2011Plasma Enhanced Atomic Layer Deposition of ZrO 2 : A Thermodynamic Approachcitations
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article
Integration of epitaxial LiNbO3 thin films with silicon technology
Abstract
International audience ; Development of bulk acoustic wave filters with ultra-wide passbands and operating at high frequencies for 5th and 6th generation telecommunication applications and micro-scale actuators, energy harvesters and sensors requires lead-free piezoelectric thin films with high electromechanical coupling and compatible with Si technology. In this paper, the epitaxial growth of 36°Y-X and 30°X-Y LiNbO3 films by direct liquid injection chemical vapor deposition on Si substrates by using epitaxial SrTiO3 layer, grown by molecular beam epitaxy, has been demonstrated. The stability of the interfaces and chemical interactions between SrTiO3, LiNbO3 and Si were studied experimentally and by thermodynamical calculations. The experimental conditions for pure 36°Y-X orientation growth have been optimized. The piezoelectricity of epitaxial 36°Y-LiNbO3/SrTiO3/Si films was confirmed by means of piezoelectric force microscopy measurements and the ferroelectric domain inversion was attained at 85 kV.cm-1 as expected for the nearly stoichiometric LiNbO3. According to the theoretical calculations, 36°Y-X LiNbO3 films on Si could offer an electromechanical coupling of 24.4% for thickness extension excitation of bulk acoustic waves and a comparable figure of merit of actuators and vibrational energy harvesters to that of standard PbZr1-xTixO3 films.