Materials Map

Discover the materials research landscape. Find experts, partners, networks.

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The Materials Map is an open tool for improving networking and interdisciplinary exchange within materials research. It enables cross-database search for cooperation and network partners and discovering of the research landscape.

The dashboard provides detailed information about the selected scientist, e.g. publications. The dashboard can be filtered and shows the relationship to co-authors in different diagrams. In addition, a link is provided to find contact information.

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Materials Map under construction

The Materials Map is still under development. In its current state, it is only based on one single data source and, thus, incomplete and contains duplicates. We are working on incorporating new open data sources like ORCID to improve the quality and the timeliness of our data. We will update Materials Map as soon as possible and kindly ask for your patience.

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in Cooperation with on an Cooperation-Score of 37%

Topics

Publications (1/1 displayed)

  • 2019Importance of point defect reactions for the atomic-scale roughness of III-V nanowire sidewalls8citations

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Chart of shared publication
Peric, Nemanja
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Vergel, Nathali Alexandra Franchina
1 / 2 shared
Caroff, Philippe
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Harmand, Jean-Christophe
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Patriarche, Gilles
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Ebert, Philipp
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Grandidier, B.
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Plissard, S. R.
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Xu, Tao
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Nys, Jean-Philippe
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Berthe, Maxime
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Chart of publication period
2019

Co-Authors (by relevance)

  • Peric, Nemanja
  • Vergel, Nathali Alexandra Franchina
  • Caroff, Philippe
  • Harmand, Jean-Christophe
  • Patriarche, Gilles
  • Ebert, Philipp
  • Grandidier, B.
  • Plissard, S. R.
  • Xu, Tao
  • Nys, Jean-Philippe
  • Berthe, Maxime
OrganizationsLocationPeople

article

Importance of point defect reactions for the atomic-scale roughness of III-V nanowire sidewalls

  • Peric, Nemanja
  • Vergel, Nathali Alexandra Franchina
  • Caroff, Philippe
  • Harmand, Jean-Christophe
  • Patriarche, Gilles
  • Ebert, Philipp
  • Grandidier, B.
  • Plissard, S. R.
  • Xu, Tao
  • Nys, Jean-Philippe
  • Álvarez, Adrian Díaz
  • Berthe, Maxime
Abstract

The surface morphology of III-V semiconductor nanowires (NWs) protected by an arsenic cap and subsequently evaporated in ultrahigh vacuum is investigated with scanning tunneling microscopy and scanning transmission electron microscopy. We show that the changes of the surface morphology as a function of the NW composition and the nature of the seed particles are intimately related to the formation and reaction of surface point defects. Langmuir evaporation close to the congruent evaporation temperature causes the formation of vacancies which nucleate and form vacancy islands on {110} sidewalls of self-catalyzed InAs NWs. However, for annealing temperatures much smaller than the congruent temperature, a new phenomenon occurs: group III vacancies form and are filled by excess As atoms, leading to surface As Ga antisites. The resulting Ga adatoms nucleate with excess As atoms at the NW edges, producing monoatomic-step islands on the {110} sidewalls of GaAs NWs. Finally, when gold atoms diffuse from the seed particle onto the {110} sidewalls during evaporation of the protective As cap, Langmuir evaporation does not take place, leaving the sidewalls of InAsSb NWs atomically flat.

Topics
  • impedance spectroscopy
  • morphology
  • surface
  • gold
  • transmission electron microscopy
  • annealing
  • evaporation
  • Arsenic
  • vacancy
  • scanning tunneling microscopy
  • point defect
  • III-V semiconductor