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| Naji, M. |
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| Motta, Antonella |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Kočí, Jan | Prague |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Ali, M. A. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Baule, Nina
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Publications (7/7 displayed)
- 2024The effect of microstructure and film composition on the mechanical properties of linear antenna CVD diamond thin filmscitations
- 2024Material Properties and Electrochemical Applications of ta-C:N Thin Films Deposited by Laser-Arccitations
- 2022Single-beam ion source enhanced growth of transparent conductive thin filmscitations
- 2022Pulsed direct-current reactive sputtering of high Young's modulus [002] oriented aluminum nitride thin filmscitations
- 2022Growth of Highly Transparent Amorphous Carbon Films Using Beam Plasma Sourcecitations
- 2021Boride-Carbon hybrid technology for ultra-wear and corrosive conditionscitations
- 2021Boride-Carbon Hybrid Technology for Ultra-Wear and Corrosive Conditionscitations
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article
Single-beam ion source enhanced growth of transparent conductive thin films
Abstract
<jats:title>Abstract</jats:title><jats:p>A single-beam ion source was developed and used in combination with magnetron sputtering to modulate the film microstructure. The ion source emits a single beam of ions that interact with the deposited film and simultaneously enhances the magnetron discharge. The magnetron voltage can be adjusted over a wide range, from approximately 240 to 130 V, as the voltage of the ion source varies from 0 to 150 V, while the magnetron current increases accordingly. The low-voltage high-current magnetron discharge enables a ‘soft sputtering mode’, which is beneficial for thin-film growth. Indium tin oxide (ITO) thin films were deposited at room temperature using a combined single-beam ion source and magnetron sputtering. The ion beam resulted in the formation of polycrystalline ITO thin films with significantly reduced resistivity and surface roughness. Single-beam ion-source-enhanced magnetron sputtering has many potential applications in which low-temperature growth of thin films is required, such as coatings for organic solar cells.</jats:p>