| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Moskovkin, Pavel
University of Namur
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (14/14 displayed)
- 2023Vein pattern vs. columnar fracture shape in Cu-Zr thin film metallic glassescitations
- 2023Finite Element Mesh Generation for Nano-scale Modeling of Tilted Columnar Thin Films for Numerical Simulationcitations
- 2023Vein pattern vs. columnar fracture shape in Cu-Zr thin film metallic glasses:Driving force and mechanismcitations
- 2021Understanding the role of energetic particles during the growth of TiO2 thin films by reactive magnetron sputtering through multi-scale Monte Carlo simulations and experimental depositioncitations
- 2021Understanding the role of energetic particles during the growth of TiO2 thin films by reactive magnetron sputtering through multi-scale Monte Carlo simulations and experimental depositioncitations
- 2021On the relationship between the plasma characteristics, the microstructure and the optical properties of reactively sputtered TiO2 thin filmscitations
- 2019Correlation of structural and optical properties using virtual materials analysiscitations
- 2018Can the normalized energy flux at the substrate control the microstructure of reactively sputtered TiO2 thin films ?
- 2018Wide range investigation of duty cycle and frequency effects on bipolar magnetron sputtering of chromium nitridecitations
- 2018TiOx deposited by magnetron sputtering: a joint modelling and experimental studycitations
- 2015Multiscale simulations of the early stages of the growth of graphene on coppercitations
- 2014On the formation of the porous structure in nanostructured a-Si coatings deposited by dc magnetron sputtering at oblique anglescitations
- 2010Surface phenomena involved in the formation of Co nanoparticles on amorphous Carbon and SiO2 deposited by magnetron sputteringcitations
- 2007Model predictions and experimental characterization of Co-Pt alloy clusterscitations
Places of action
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article
TiOx deposited by magnetron sputtering: a joint modelling and experimental study
Abstract
This paper presents a 3D multiscale simulation approach to model magnetron reactive sputter deposition of TiOx⩽2at various O2 inlets and its validation against experimental results. The simulation first involves the transport of sputtered material in a vacuum chamber by means of a three-dimensional direct simulation Monte Carlo (DSMC) technique. Second, the film growth at different positions on a 3D substrate is simulated using a kinetic Monte Carlo (kMC) method. When simulating the transport of species in the chamber, wall chemistry <br/>reactions are taken into account in order to get the proper content of the reactive species in the volume. Angular and energy distributions of particles are extracted from DSMC and used for film growth modelling by kMC.<br/>Along with the simulation, experimental deposition of TiOx coatings on silicon samples placed at different positions on a curved sample holder was performed. The experimental results are in agreement with the simulated ones. For a given coater, the plasma phase hysteresis behaviour, film composition and film morphology are predicted. The used methodology can be applied to any coater and any films. This paves the way to the elaboration of a virtual coater allowing a user to predict composition and morphology of films deposited in silico.