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| Naji, M. |
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| Azevedo, Nuno Monteiro |
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| Rignanese, Gian-Marco |
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Huskens, Jurriaan
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (9/9 displayed)
- 2023Solvent Optimization Studies for a New EURO-GANEX Process with 2,2'-Oxybis(<i>N,N</i>-di-<i>n</i>-decylpropanamide) (mTDDGA) and Its Radiolysis Productscitations
- 2017Highly doped silicon nanowires by monolayer dopingcitations
- 2013Symmetric Large-Area Metal-Molecular Monolayer-Metal Junctions by Wedging Transfercitations
- 2011Local Doping of Silicon Using Nanoimprint Lithography and Molecular Monolayerscitations
- 2010Combining retraction edge lithography and plasma etching for arbitrary contour nanoridge fabricationcitations
- 2010Visualizing resonance energy transfer in supramolecular surface patterns of β-CD-functionalized quantum dot hosts and organic dye guests by fluorescence lifetime imagingcitations
- 2009Microcontact Printing of Dendrimers, Proteins, and Nanoparticles by Porous Stampscitations
- 2008Fabrication of a silicon oxide stamp by edge lithography reinforced with silicon nitride for nanoimprint lithographycitations
- 2008Monolithics silicon nano-ridge fabrication by edge lithography and wet anisotropic etching of silicon
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article
Fabrication of a silicon oxide stamp by edge lithography reinforced with silicon nitride for nanoimprint lithography
Abstract
The fabrication of a stamp reinforced with silicon nitride is presented for its use in nanoimprint lithography. The fabrication process is based on edge lithography using conventional optical lithography and wet anisotropic etching of 110 silicon wafers. SiO2 nano-ridges of 20 nm in width were fabricated. A silicon rich nitride layer is deposited over the original SiO2 nano-ridges to improve the ridge strength and to achieve a positive tapered shape which is beneficial for nanoimprinting. A replica of the nano-ridges with silicon rich nitride shield is obtained by imprinting the stamp into thermoplastic nanoimprint polymer mr-I 7010E