| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Moskovkin, Pavel
University of Namur
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (14/14 displayed)
- 2023Vein pattern vs. columnar fracture shape in Cu-Zr thin film metallic glassescitations
- 2023Finite Element Mesh Generation for Nano-scale Modeling of Tilted Columnar Thin Films for Numerical Simulationcitations
- 2023Vein pattern vs. columnar fracture shape in Cu-Zr thin film metallic glasses:Driving force and mechanismcitations
- 2021Understanding the role of energetic particles during the growth of TiO2 thin films by reactive magnetron sputtering through multi-scale Monte Carlo simulations and experimental depositioncitations
- 2021Understanding the role of energetic particles during the growth of TiO2 thin films by reactive magnetron sputtering through multi-scale Monte Carlo simulations and experimental depositioncitations
- 2021On the relationship between the plasma characteristics, the microstructure and the optical properties of reactively sputtered TiO2 thin filmscitations
- 2019Correlation of structural and optical properties using virtual materials analysiscitations
- 2018Can the normalized energy flux at the substrate control the microstructure of reactively sputtered TiO2 thin films ?
- 2018Wide range investigation of duty cycle and frequency effects on bipolar magnetron sputtering of chromium nitridecitations
- 2018TiOx deposited by magnetron sputtering: a joint modelling and experimental studycitations
- 2015Multiscale simulations of the early stages of the growth of graphene on coppercitations
- 2014On the formation of the porous structure in nanostructured a-Si coatings deposited by dc magnetron sputtering at oblique anglescitations
- 2010Surface phenomena involved in the formation of Co nanoparticles on amorphous Carbon and SiO2 deposited by magnetron sputteringcitations
- 2007Model predictions and experimental characterization of Co-Pt alloy clusterscitations
Places of action
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article
On the formation of the porous structure in nanostructured a-Si coatings deposited by dc magnetron sputtering at oblique angles
Abstract
The formation of the porous structure in dc magnetron sputtered amorphous silicon thin films at low temperatures is studied when using helium and/or argon as the processing gas. In each case, a-Si thin films were simultaneously grown at two different locations in the reactor which led to the assembly of different porous structures. The set of four fabricated samples has been analyzed at the microstructural level to elucidate the characteristics of the porous structure under the different deposition conditions. With the help of a growth model, we conclude that the chemical nature of the sputter gas not only affects the sputtering mechanism of Si atoms from the target and their subsequent transport in the gaseous/plasma phase towards the film, but also the pore formation mechanism and dynamics. When Ar is used, pores emerge as a direct result of the shadowing processes of Si atoms, in agreement with Thornton's structure zone model. The introduction of He produces, in addition to the shadowing effects, a new process where a degree of mobility results in the coarsening of small pores. Our results also highlight the influence of the composition of sputtering gas and tilt angles (for oblique angle deposition) on the formation of open and/or occluded porosity.