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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Jacob, M. V.
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (10/10 displayed)
- 2008Microwave Characterisation of MgTe2O5 using quasi TE0np Mode Dielectric Resonator Technique
- 2008Bi-2(Zn2/3-x/3Nb4/3-2x/3Tix)O-7 Ceramics - A High Permittivity Microwave Dielectrics for Electronics Application
- 2007Non-destructive complex permittivity measurement of low permittivity thin film materialscitations
- 2006Cryogenic complex anisotropic permittivity of magnesium fluoridecitations
- 2006Dielectric characterisation of Barium Fluoride at cryogenic temperatures using TE011 and quasi TE0mn mode dielectric resonatorscitations
- 2005Low temperature complex permittivity of MgF/sub 2/ at microwave frequencies from TE/sub 01/spl delta// modescitations
- 2004Recent advances in measurements of permittivity and dielectric losses at microwave frequenciescitations
- 2004Microwave characterization of (La,Sr)(AlTa)O3 using TE011 mode dielectric resonator
- 2003Lithium tantalate - a high permittivity dielectric material for microwave communication systemscitations
- 2003Microwave characterisation of CaF2 at cryogenic temperatures using a dielectric resonator techniquecitations
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article
Non-destructive complex permittivity measurement of low permittivity thin film materials
Abstract
Complex permittivity measurement of low permittivity thin films is necessary to understand the fundamental properties and to implement these materials in devices. A new technique has been developed employing split-post dielectric resonators at operating frequencies of 10 GHz and 20 GHz to measure relative permittivity and loss tangent of low permittivity materials, respectively. The results have been confirmed by comparing the measurements with those of thick films fabricated on a quartz substrate. This paper substantiates the validity of performing non-destructive measurements of the complex permittivity of thin polymer films which was not previously possible with the split-post dielectric resonator technique. A detailed error analysis of the measurement procedure is also reported in this paper.