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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Gries, Thomas
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (19/19 displayed)
- 2024High quality ZnMgAlO thin films by ultrasonic spray pyrolysis: tuning of optoelectronic properties for use as TCO, window layer, and buffer layer in all-oxide solar cellscitations
- 2024ZnMgO Thin Films by Ultrasonic Spray Pyrolysis: Modulation of Optical and Electrical Properties by Post‐annealing and Magnesium Compositioncitations
- 2023Carbon Rovings as Strain Sensor in TRC Structures: Effect of Roving Cross-Sectional Shape and Coating Material on the Electrical Response under Bending Stresscitations
- 2022Multiple assembly strategies for silica aerogel-fiber combinations – a reviewcitations
- 2021Enhanced photoelectrocatalytic hydrogen evolution using off-stoichiometry La 0.43 FeO y filmscitations
- 2021Effect of the precursor concentration on structural properties of ZnO thin films by ultrasonic spray pyrolysis
- 2021Elaboration of high-transparency ZnO thin films by ultrasonic spray pyrolysis with fast growth ratecitations
- 2020Influence of transcrystalline layer on finite element mesoscale modeling of polyamide 6 based single polymer laminate compositescitations
- 2020Influence of transcrystalline layer on finite element mesoscale modeling of polyamide 6 based single polymer laminate compositescitations
- 2020Influence of transcrystalline layer on finite element mesoscale modeling of polyamide 6 based single polymer laminate compositescitations
- 2020Experimental and numerical studies of process variabilities in biaxial carbon fiber braids
- 2020Heterostructured g-CN/TiO 2 Photocatalysts Prepared by Thermolysis of g-CN/MIL-125(Ti) Composites for Efficient Pollutant Degradation and Hydrogen Productioncitations
- 2018Development of a Polymer-Based Biodegradable Neurovascular Stent Prototypecitations
- 2014Determining electron temperature and electron density in moderate pressure H-2/CH4 microwave plasmacitations
- 2014Local modification of the microstructure and electrical properties of multifunctional Au-YSZ nanocomposite thin films by laser interference patterningcitations
- 2013Plasma-surface interaction in heptanecitations
- 2012Influence of laser interference patterning on microstructure and friction behavior of gold/yttria-stabilized zirconia nanocomposite thin filmscitations
- 2011Processing and characterization of braided NiTi microstents for medical applications
- 2011Hybrid Fabrics as Cement Matrix Reinforcement
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article
Determining electron temperature and electron density in moderate pressure H-2/CH4 microwave plasma
Abstract
The electron temperature and electron density are measured in a microwave (MW) plasma-assisted chemical vapour diamond deposition reactor for different experimental conditions by varying the substrate temperature, methane content and MW power density. Optical emission spectroscopy (OES) and MW interferometry are used to probe the discharge generated in a stainless steel resonant cavity excited at a frequency of 2.45 GHz. Changing the substrate temperature from 630 to 900 degrees C does not show any significant influence on the electron temperature or on the electron density. Increasing the methane content from 0 to 10% does not lead to any modification of the electron temperature or density. However between 10% and 20% CH, a decrease of the electron density is observed which may be attributed to soot particle formation. The electron density increases in the range of (1.2-10) x 1011 cm(-3) from moderate power density conditions (50 hPa/1000 W) to high power density conditions (250 hPa/3500 W). OES measurements show that the electron temperature exhibits a flat axial profile in the plasma bulk and ranges from 14 000K at (25 hPa/600 W) to 10 500K at (400 hPa/3000 W).