| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Reboud, Vincent
CEA Grenoble
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (10/10 displayed)
- 2023Innovative annealing technology for thermally stable Ni(GeSn) alloyscitations
- 2022Recrystallization of thick implanted GeSn layers with nanosecond laser annealingcitations
- 2022Room temperature spectral characterization of direct band gap Ge$_{0.85}$Sn$_{0.15}$ LEDs and photodiodescitations
- 2022Impact of strain on Si and Sn incorporation in (Si)GeSn alloys by STEM analysescitations
- 2021GeSnOI mid-infrared laser technologycitations
- 2020Reduced Lasing Thresholds in GeSn Microdisk Cavities with Defect Management of the Optically Active Regioncitations
- 2020(Invited) Tensile Strain Engineering and Defects Management in GeSn Laser Cavitiescitations
- 2020Impact and behavior of Sn during the Ni/GeSn solid-state reactioncitations
- 2019Effects of alloying elements (Pt or Co) on nickel-based contact technology for GeSn layerscitations
- 2006Submicron three-dimensional structures fabricated by reverse contact UV nanoimprint lithographycitations
Places of action
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article
Recrystallization of thick implanted GeSn layers with nanosecond laser annealing
Abstract
<jats:p> We investigate the recrystallization of thick phosphorus-implanted GeSn layers using 308 nm Ultraviolet Nanosecond Laser Annealing (UV-NLA). We identify the optimal annealing conditions leading to the reconstruction of Ge<jats:sub>0.92</jats:sub>Sn<jats:sub>0.08</jats:sub> crystal amorphized by dopant implantation. The fully recrystallized GeSn layers present specific structures with localized tin and strain variations. Above the non-amorphized and unmelted Ge<jats:sub>0.92</jats:sub>Sn<jats:sub>0.08</jats:sub> seed layer, a first highly tensile strained GeSn sublayer is formed, with a tin gradient from 2.5% up to 10.5%. Closer to the surface, a second sublayer consists of tin-enriched vertical structures in a Ge<jats:sub>0.93</jats:sub>Sn<jats:sub>0.07</jats:sub> matrix. Laser annealing enables us to reverse the strain of the GeSn layer. The initial GeSn presents a compressive strain of −0.10%, while the recrystallized Ge<jats:sub>0.93</jats:sub>Sn<jats:sub>0.07</jats:sub> matrix is tensile strained at 0.39%. UV-NLA presents the advantages of (i) local annealing that recrystallizes amorphized GeSn layers after implantation without excessive tin segregation and (ii) reversing the strain of epitaxial GeSn layers from compressive to tensile. Our results open up promising perspectives for the integration of GeSn mid-IR photonic devices. </jats:p>