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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Taccardi, Nicola |
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Petrov, R. H. | Madrid |
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Bih, L. |
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Casati, R. |
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Kočí, Jan | Prague |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Biswas, Sangram
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article
Resistance fluctuation spectroscopy of thin films of 3D topological insulator BiSbTeSe<SUB>1.6</SUB>
Abstract
Despite several years of studies, the origin of slow-kinetics of charge-carriers at the surface-states of strong topological insulators remains abstruse. In this article, we report on studies of charge dynamics of thin films of the 3-dimensional strong topological insulator material BiSbTeSe<SUB>1.6</SUB> grown by pulsed laser deposition (PLD). The bulk of the films was insulating, making them suitable for transport studies of topological surface-states. Despite being disordered and granular, the films show definite signatures of the presence of topological surface-states with electronic transport coherence lengths comparable to those of high-quality grown films grown by molecular beam epitaxy (MBE). At high temperatures, the resistance fluctuations in these films were found to be dominated by trapping-detrapping of charge carriers from multiple defect-levels of the bulk. At low temperatures, fluctuations in the resistance of surface-states, arising due to the coupling of surface transport with defect dynamics in bulk, determine the noise. We thus confirm that the measured low-frequency fluctuations in these films, over the entire temperature range of 20 mK-300 K, are determined primarily by bulk defect density. The magnitude of noise was comparable to that measured on bulk-exfoliated films but was slightly higher than that in MBE grown films. Our studies establish PLD as a viable route to develop high-quality topological insulator materials....