| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Gann, Eliot
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (22/22 displayed)
- 2022Reassessing the Significance of Reduced Aggregation and Crystallinity of Naphthalene Diimide-Based Copolymer Acceptors in All-Polymer Solar Cellscitations
- 2019Residual solvent additive enables the nanostructuring of PTB7-Th:PC71BM solar cells via soft lithographycitations
- 2018Tuning the Molecular Weight of the Electron Accepting Polymer in All-Polymer Solar Cellscitations
- 2018Nature and Extent of Solution Aggregation Determines the Performance of P(NDI2OD-T2) Thin-Film Transistorscitations
- 2018Impact of Acceptor Fluorination on the Performance of All-Polymer Solar Cellscitations
- 2018Thionation of naphthalene diimide moleculescitations
- 2018Blade Coating Aligned, High-Performance, Semiconducting-Polymer Transistorscitations
- 2018Design of New Isoindigo-Based Copolymer for Ambipolar Organic Field-Effect Transistorscitations
- 2017Understanding charge transport in lead iodide perovskite thin-film field-effect transistorscitations
- 2017Influence of fluorination on the microstructure and performance of diketopyrrolopyrrole‐based polymer solar cellscitations
- 2017Unconventional Molecular Weight Dependence of Charge Transport in the High Mobility n-type Semiconducting Polymer P(NDI2OD-T2)citations
- 2017Critical Role of Pendant Group Substitution on the Performance of Efficient All-Polymer Solar Cellscitations
- 2017Influence of fluorination on the microstructure and performance of diketopyrrolopyrrole-based polymer solar cellscitations
- 2017Influence of Fullerene Acceptor on the Performance, Microstructure, and Photophysics of Low Bandgap Polymer Solar Cellscitations
- 2017Isolating and quantifying the impact of domain purity on the performance of bulk heterojunction solar cellscitations
- 2016Metal Evaporation-Induced Degradation of Fullerene Acceptors in Polymer/Fullerene Solar Cellscitations
- 2016Impact of Fullerene Mixing Behavior on the Microstructure, Photophysics, and Device Performance of Polymer/Fullerene Solar Cellscitations
- 2016Coulomb Enhanced Charge Transport in Semicrystalline Polymer Semiconductorscitations
- 2016Vinylene-Linked Oligothiophene-Difluorobenzothiadiazole Copolymer for Transistor Applicationscitations
- 2016EDOT-diketopyrrolopyrrole copolymers for polymer solar cellscitations
- 2016Azido-Functionalized Thiophene as a Versatile Building Block to Cross-Link Low-Bandgap Polymerscitations
- 2015Increased exciton dipole moment translates into charge-transfer excitons in thiophene-fluorinated low-bandgap polymers for organic photovoltaic applicationscitations
Places of action
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article
Residual solvent additive enables the nanostructuring of PTB7-Th:PC71BM solar cells via soft lithography
Abstract
The nanoimprinting of polymer solar cells via soft lithography is an attractive approach for enhancing light absorption in the active layer. Many efficient polymer solar cells utilize a high boiling point solvent additive such as 1,8-diiodooctane (DIO) during active layer deposition to optimize morphology. By studying active layer films based on the PTB7-Th:PC71BM system prepared with different amounts of the solvent additive DIO, it is shown that the soft imprinting of such blends critically relies upon the presence of residual solvent additive that plasticizes the film. In particular, a minimum of ∼ 2 volume % of DIO in the casting solution is found to be necessary to enable effective imprinting. The microstructure of imprinted layers is also comprehensively characterized using atomic force microscopy, grazing incidence wide-angle X-ray scattering and resonant soft X-ray scattering, demonstrating that soft lithography can be used to effectively impart structure on the a photonic length scale without changing the nanoscale morphology and microstructure.