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Zhou, Xiuli
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article
Electron energy loss spectroscopy of plasmon resonances in titanium nitride thin films
Abstract
<jats:p>The plasmon resonance characteristics of refractory TiN thin films were analyzed using electron energy-loss spectroscopy (EELS). A bulk plasmon resonance was observed at 2.81 eV and a weaker surface plasmon resonance peak was detected at 2.05 eV. These findings are compared to finite-difference time-domain simulations based on measured optical data. The calculated values for both the bulk and surface resonances (2.74 eV and 2.15 eV, respectively) show reasonable agreement with those measured via EELS. The amplitude of the experimentally observed surface resonance was weaker than that typically encountered in noble metal nanostructures, and this is discussed in the context of electron density and reduced spatial confinement of the resonance mode in the thin-film geometry.</jats:p>