693.932 PEOPLE
| People | Locations | Statistics |
|---|---|---|
| Naji, M. |
| |
| Motta, Antonella |
| |
| Aletan, Dirar |
| |
| Mohamed, Tarek |
| |
| Ertürk, Emre |
| |
| Taccardi, Nicola |
| |
| Kononenko, Denys |
| |
| Petrov, R. H. | Madrid |
|
| Alshaaer, Mazen | Brussels |
|
| Bih, L. |
| |
| Casati, R. |
| |
| Muller, Hermance |
| |
| Kočí, Jan | Prague |
|
| Šuljagić, Marija |
| |
| Kalteremidou, Kalliopi-Artemi | Brussels |
|
| Azam, Siraj |
| |
| Ospanova, Alyiya |
| |
| Blanpain, Bart |
| |
| Ali, M. A. |
| |
| Popa, V. |
| |
| Rančić, M. |
| |
| Ollier, Nadège |
| |
| Azevedo, Nuno Monteiro |
| |
| Landes, Michael |
| |
| Rignanese, Gian-Marco |
|
Greczynski, Grzegorz
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (83/83 displayed)
- 2025Epitaxial growth of TiZrNbTaN films without external heating by high-power impulse magnetron sputteringcitations
- 2024Reflective, polarizing, and magnetically soft amorphous neutron optics with $^{11}$B-enriched B$_4$Ccitations
- 2024Advanced film/substrate interface engineering for adhesion improvement employing time- and energy-controlled metal ion irradiationcitations
- 2024Reflective, polarizing, and magnetically soft amorphous neutron optics with 11B-enriched B4Ccitations
- 2024High-power impulse magnetron sputter deposition of TiBx thin films : Effects of pulse length and peak current densitycitations
- 2024Electronic structure and thermoelectric properties of epitaxial Sc1−xVxNy thin films grown on MgO(001)citations
- 2023Dense and hard TiWC protective coatings grown with tungsten ion irradiation using WC-HiPIMS/TiC-DCMS co-sputtering technique without external heatingcitations
- 2023Towards lowering energy consumption during magnetron sputtering: Benefits of high-mass metal ion irradiationcitations
- 2023Energy-efficient physical vapor deposition of dense and hard Ti-Al-W-N coatings deposited under industrial conditionscitations
- 2023Morphology control in Ni/Ti multilayer neutron mirrors by ion-assisted interface engineering and B$_4$C incorporationcitations
- 2023Determining role of W+ ions in the densification of TiAlWN thin films grown by hybrid HiPIMS/DCMS technique with no external heatingcitations
- 2023Thermoelectric properties and electronic structure of Cr(Mo,V)Nx thin films studied by synchrotron and lab-based x-ray spectroscopycitations
- 2023Morphology control in Ni/Ti multilayer neutron mirrors by ion-assisted interface engineering and B4C incorporationcitations
- 2023Discovery of Guinier-Preston zone hardening in refractory nitride ceramicscitations
- 2023Critical method evaluation refutes the Ar 2p signal of implanted Ar for referencing X-ray photoelectron spectracitations
- 2022High-entropy transition metal nitride thin films alloyed with Al : Microstructure, phase composition and mechanical propertiescitations
- 2022Dense, single-phase, hard, and stress-free Ti0.32Al0.63W0.05N films grown by magnetron sputtering with dramatically reduced energy consumptioncitations
- 2022Domain epitaxial growth of Ta3N5 film on c-plane sapphire substratecitations
- 2022Nano-columnar, self-organised NiCrC/a-C:H thin films deposited by magnetron sputteringcitations
- 2022Microstructure, mechanical, and corrosion properties of Zr1-xCrxBy diboride alloy thin films grown by hybrid high power impulse/DC magnetron co-sputteringcitations
- 2022The effect of the Nb concentration on the corrosion resistance of nitrogen-containing multicomponent TiZrTaNb-based films in acidic environmentscitations
- 2022Thermal, electrical, and mechanical properties of hard nitrogen-alloyed Cr thin films deposited by magnetron sputteringcitations
- 2021Orthorhombic Ta3-xN5-yOy thin films grown by unbalanced magnetron sputtering : The role of oxygen on structure, composition, and optical propertiescitations
- 2021Dense Ti0.67Hf0.33B1.7 thin films grown by hybrid HfB2-HiPIMS/TiB2-DCMS co-sputtering without external heatingcitations
- 2021Toward energy-efficient physical vapor deposition : Routes for replacing substrate heating during magnetron sputter deposition by employing metal ion irradiationcitations
- 2021Age hardening in superhard ZrB2-rich Zr1-xTaxBy thin filmscitations
- 2021Towards energy-efficient physical vapor deposition : Mapping out the effects of W+ energy and concentration on the densification of TiAlWN thin films grown with no external heatingcitations
- 2021Preparation and tunable optical properties of amorphous AlSiO thin filmscitations
- 2021Phase formation and structural evolution of multicomponent (CrFeCo)Ny filmscitations
- 2021Phase Transformation and Superstructure Formation in (Ti0.5, Mg0.5)N Thin Films through High-Temperature Annealingcitations
- 2021Systematic compositional analysis of sputter-deposited boron-containing thin filmscitations
- 2020Oxidation behaviour of V2AlC MAX phase coatingscitations
- 2020Microstructure and mechanical, electrical, and electrochemical properties of sputter-deposited multicomponent (TiNbZrTa)N-x coatingscitations
- 2020Microstructure and mechanical, electrical, and electrochemical properties of sputter-deposited multicomponent (TiNbZrTa)N-x coatingscitations
- 2020Growth of dense, hard yet low-stress Ti0.40Al0.27W0.33N nanocomposite films with rotating substrate and no external substrate heatingcitations
- 2020Effect of nitrogen content on microstructure and corrosion resistance of sputter-deposited multicomponent (TiNbZrTa)N-x filmscitations
- 2020Improving the high-temperature oxidation resistance of TiB2 thin films by alloying with Alcitations
- 2020Effect of nitrogen content on microstructure and corrosion resistance of sputter-deposited multicomponent (TiNbZrTa)Nx filmscitations
- 2019Strategy for simultaneously increasing both hardness and toughness in ZrB2-rich Zr1-xTaxBy thin filmscitations
- 2019Reactive magnetron sputtering of tungsten target in krypton/trimethylboron atmospherecitations
- 2019Corrosion Resistant TiTaN and TiTaAlN Thin Films Grown by Hybrid HiPIMS/DCMS Using Synchronized Pulsed Substrate Bias with No External Substrate Heatingcitations
- 2019A simple model for non-saturated reactive sputtering processescitations
- 2019Synthesis and characterization of single-phase epitaxial Cr2N thin films by reactive magnetron sputteringcitations
- 2019Control over the Phase Formation in Metastable Transition Metal Nitride Thin Films by Tuning the Al+ Subplantation Depthcitations
- 2019Effect of impurities on morphology, growth mode, and thermoelectric properties of (111) and (001) epitaxial-like ScN filmscitations
- 2018Time evolution of ion fluxes incident at the substrate plane during reactive high-power impulse magnetron sputtering of groups IVb and VIb transition metals in Ar/N-2citations
- 2018Reference binding energies of transition metal carbides by core-level x-ray photoelectron spectroscopy free from Ar+ etching artefactscitations
- 2018Controlling the B/Ti ratio of TiBx thin films grown by high-power impulse magnetron sputteringcitations
- 2018Effect of ion-implantation-induced defects and Mg dopants on the thermoelectric properties of ScNcitations
- 2017Control of the metal/gas ion ratio incident at the substrate plane during high-power impulse magnetron sputtering of transition metals in Arcitations
- 2017Core-level spectra and binding energies of transition metal nitrides by non-destructive x-ray photoelectron spectroscopy through capping layerscitations
- 2017Unprecedented Al supersaturation in single-phase rock salt structure VAlN films by Al+ subplantationcitations
- 2017Low-temperature growth of dense and hard Ti0.41Al0.51Ta0.08N films via hybrid HIPIMS/DC magnetron co-sputtering with synchronized metal-ion irradiationcitations
- 2017Selectable phase formation in VAlN thin films by controlling Al+ subplantation depthcitations
- 2017Comparative study of macro- and microtribological properties of carbon nitride thin films deposited by HiPIMScitations
- 2017Impact of B4C co-sputtering on structure and optical performance of Cr/Sc multilayer X-ray mirrorscitations
- 2017Impact of B4C co-sputtering on structure and optical performance of Cr/Sc multilayer X-ray mirrorscitations
- 2017Gas rarefaction effects during high power pulsed magnetron sputtering of groups IVb and VIb transition metals in Arcitations
- 2017Native target chemistry during reactive dc magnetron sputtering studied by ex-situ x-ray photoelectron spectroscopycitations
- 2016Improved adhesion of carbon nitride coatings on steel substrates using metal HiPIMS pretreatmentscitations
- 2016Nitrogen-doped bcc-Cr films: Combining ceramic hardness with metallic toughness and conductivitycitations
- 2016Novel transparent Mg-Si-O-N thin films with high hardness and refractive indexcitations
- 2016Theoretical and experimental study of metastable solid solutions and phase stability within the immiscible Ag-Mo binary systemcitations
- 2016Peak amplitude of target current determines deposition rate loss during high power pulsed magnetron sputteringcitations
- 2016A comparative study of direct current magnetron sputtering and high power impulse magnetron sputtering processes for CNX thin film growth with different inert gasescitations
- 2016Rolling contact fatigue of bearing components coated with carbon nitride thin filmscitations
- 2016Venting temperature determines surface chemistry of magnetron sputtered TiN filmscitations
- 2015Synthesis and characterization of Zr2Al3C4 thin filmscitations
- 2015Strategy for tuning the average charge state of metal ions incident at the growing film during HIPIMS depositioncitations
- 2015Control of Ti1-xSixN nanostructure via tunable metal-ion momentum transfer during HIPIMS/DCMS co-depositioncitations
- 2015Low-temperature growth of low friction wear-resistant amorphous carbon nitride thin films by mid-frequency, high power impulse, and direct current magnetron sputteringcitations
- 2014Novel strategy for low-temperature, high-rate growth of dense, hard, and stress-free refractory ceramic thin filmscitations
- 2014X-ray photoelectron spectroscopy analyses of the electronic structure of polycrystalline Ti1-xAlxN thin films with 0 < x < 0.96citations
- 2014Growth and properties of amorphous Ti-B-Si-N thin films deposited by hybrid HIPIMS/DC-magnetron co-sputtering from TiB2 and Si targetscitations
- 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001) Thin Films Analyzed by X-ray Photoelectron Spectroscopy: 3. Polycrystalline V0.49Mo0.51N1.02citations
- 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001) Thin Films Analyzed by X-ray Photoelectron Spectroscopy: 2. Single-crystal V0.47Mo0.53N0.92citations
- 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001)Thin Films Analyzed by X-ray PhotoelectronSpectroscopy: 3. Polycrystalline V0.49Mo0.51N1.02citations
- 2013Influence of inert gases on the reactive high power pulsed magnetron sputtering process of carbon-nitride thin filmscitations
- 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001) Thin Films Analyzed by X-ray Photoelectron Spectroscopy: 1. Single-crystal V0.48Mo0.52N0.64citations
- 2012Metal versus rare-gas ion irradiation during Ti1-xAlxN film growth by hybrid high power pulsed magnetron/dc magnetron co-sputtering using synchronized pulsed substrate biascitations
- 2011Ti-Si-C-N Thin Films Grown by Reactive Arc Evaporation from Ti3SiC2 Cathodescitations
- 2011CF(x) thin solid films deposited by high power impulse magnetron sputtering: Synthesis and characterizationcitations
- 2010Time and energy resolved ion mass spectroscopy studies of the ion flux during high power pulsed magnetron sputtering of Cr in Ar and Ar/N-2 atmospherescitations
Places of action
| Organizations | Location | People |
|---|
article
Theoretical and experimental study of metastable solid solutions and phase stability within the immiscible Ag-Mo binary system
Abstract
Metastable solid solutions are phases that are synthesized far from thermodynamic equilibrium and offer a versatile route to design materials with tailor-made functionalities. One of the most investigated classes of metastable solid solutions with widespread technological implications is vapor deposited ternary transition metal ceramic thin films (i.e., nitrides, carbides, and borides). The vapor-based synthesis of these ceramic phases involves complex and difficult to control chemical interactions of the vapor species with the growing film surface, which often makes the fundamental understanding of the composition-properties relations a challenging task. Hence, in the present study, we investigate the phase stability within an immiscible binary thin film system that offers a simpler synthesis chemistry, i.e., the Ag-Mo system. We employ magnetron co-sputtering to grow Ag1-xMox thin films over the entire composition range along with x-ray probes to investigate the films structure and bonding properties. Concurrently, we use density functional theory calculations to predict phase stability and determine the effect of chemical composition on the lattice volume and the electronic properties of Ag-Mo solid solutions. Our combined theoretical and experimental data show that Mo-rich films (x >= similar to 0.54) form bcc Mo-Ag metastable solid solutions. Furthermore, for Ag-rich compositions (x <= similar to 0.21), our data can be interpreted as Mo not being dissolved in the Ag fcc lattice. All in all, our data show an asymmetry with regards to the mutual solubility of Ag and Mo in the two crystal structures, i.e., Ag has a larger propensity for dissolving in the bcc-Mo lattice as compared to Mo in the fcc-Ag lattice. We explain these findings in light of isostructural short-range clustering that induces energy difference between the two (fcc and bcc) metastable phases. We also suggest that the phase stability can be explained by the larger atomic mobility of Ag atoms as compared to that of Mo. The mechanisms ...