• Taminiau, I.
• Ofitserov, A.
• Bergman, M.
• Crama, L.
• Baarle, G. J. C. Van
• Spronsen, M. A. Van
• Verdoes, G.
• Cañas-Ventura, M. E.
• Stoltz, D.
• Bakker, J. W.
• Navarro, V.
• Roobol, S. B.
• Tuijn, P. C. Van Der
• Herbschleb, C. T.
• Frenken, Joost W. M.
• Liu, Q.

Abstract

<p>To enable atomic-scale observations of model catalysts under conditions approaching those used by the chemical industry, we have developed a second generation, high-pressure, high-temperature scanning tunneling microscope (STM): the ReactorSTM. It consists of a compact STM scanner, of which the tip extends into a 0.5 ml reactor flow-cell, that is housed in a ultra-high vacuum (UHV) system. The STM can be operated from UHV to 6 bars and from room temperature up to 600 K. A gas mixing and analysis system optimized for fast response times allows us to directly correlate the surface structure observed by STM with reactivity measurements from a mass spectrometer. The in situ STM experiments can be combined with ex situ UHV sample preparation and analysis techniques, including ion bombardment, thin film deposition, low-energy electron diffraction and x-ray photoelectron spectroscopy. The performance of the instrument is demonstrated by atomically resolved images of Au(111) and atom-row resolution on Pt(110), both under high-pressure and high-temperature conditions.</p>

Topics

• Deposition
• impedance spectroscopy
• surface
• experiment
• thin film
• x-ray photoelectron spectroscopy
• electron diffraction
• scanning tunneling microscopy