• Trampert, A.
• Vescan, A.
• Heuken, M.
• Kraeusel, Simon
• Wang, K. R.
• Hourahine, Benjamin
• Trager-Cowan, Carol
• Bruckbauer, Jochen
• Edwards, Paul
• Day, A. P.
• Kalisch, H.
• Mauder, C.
• Giesen, C.
• Naresh-Kumar, G.

Abstract

Threading dislocations, stacking faults, and associated partial dislocations significantly degrade the optical and electrical properties of materials such as non-polar III-nitride semiconductor thin films. Stacking faults are generally difficult to detect and quantify with existing characterization techniques. We demonstrate the use of electron channeling contrast imaging in the scanning electron microscope to non-destructively reveal basal plane stacking faults terminated by partial dislocations in m-plane GaN and InGaN/GaN multiple quantum well structures grown on γ-LiAlO2 by metal organic vapor phase epitaxy.

Topics

• phase
• thin film
• semiconductor
• nitride
• dislocation
• stacking fault