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Oeynhausen, Viola Von
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article
Design and capabilities of an experimental setup based on magnetron sputtering for formation and deposition of size-selected metal clusters on ultra-clean surfaces
Abstract
The design and performance of an experimental setup utilizing a magnetron sputtering source for production of beams of ionized size-selected clusters for deposition in ultra-high vacuum is described. For the case of copper cluster formation the influence of different source parameters is studied and analyzed. Size-selected clusters are deposited on substrates and the efficiency of an electrostatic quadrupole mass selector (QMS) is tested. Height analysis using atomic force microscopy (AFM) demonstrates relative standard size deviations of 7-10 % for the particles of various sizes between 6 nm and 19 nm. Combined analysis by AFM and transmission electron microscopy (TEM) reveals that the clusters preserve almost spherical shape after the deposition on amorphous carbon substrates. Supported nanoparticles of a few nanometres in diameter have crystalline structure with a face-centered cubic (fcc) lattice.