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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Taccardi, Nicola |
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Petrov, R. H. | Madrid |
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Casati, R. |
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Kočí, Jan | Prague |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Kluth, S. M.
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article
Extended x-ray absorption fine structure study of porous GaSb formed by ion implantation
Abstract
<p>Porous GaSb has been formed by Ga ion implantation into crystalline GaSb substrates at either room temperature or -180 C. The morphology has been characterized using scanning electron microscopy and the atomic structure was determined using extended x-ray absorption fine structure spectroscopy. Room-temperature implantation at low fluences leads to the formation of ∼20-nm voids though the material remains crystalline. Higher fluences cause the microstructure to evolve into a network of amorphous GaSb rods ∼15 nm in diameter. In contrast, implantation at -180 C generates large, elongated voids but no rods. Upon exposure to air, the surface of the porous material is readily oxidized yielding Ga <sub>2</sub>O <sub>3</sub> and metallic Sb precipitates, the latter resulting from the reduction of unstable Sb <sub>2</sub>O <sub>3</sub>. We consider and discuss the atomic-scale mechanisms potentially operative during the concurrent crystalline-to-amorphous and continuous-to-porous transformations.</p>