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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Reuther, Helfried
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Publications (5/5 displayed)
- 2013Forming-free resistive switching in multiferroic BiFeO3 thin films with enhanced nanoscale shuntscitations
- 2012GaMnN epitaxial films with high magnetization
- 2011Reduced leakage current in BiFeO3 thin films with rectifying contactscitations
- 2008In-situ study of the preferential orientation of magnetron sputtered ni-ti thin films as a function of bias and substrate type
- 2008Study of graded Ni-Ti shape memory alloy film growth on Si(100) substratecitations
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article
Reduced leakage current in BiFeO3 thin films with rectifying contacts
Abstract
<p>BiFeO<sub>3</sub> thin films were grown on Pt/c-sapphire substrates by pulsed laser deposition with different growth rates. With increasing growth rate the leakage current is decreased and the conduction mechanism changes from bulk-limited Poole-Frenkel emission to interface-limited Schottky emission. In the present letter, we show that only the growth rate of the BiFeOv<sub>3</sub> films close to the metal contacts has to be increased in order to reduce the leakage current and to observe saturated polarization-electric field hysteresis loops.</p>