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Sobiecki, Jerzy
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article
Formation Of Chromium Nitride Layers Produced By MOPACVD Processes Under Glow Discharge Conditions
Abstract
Because of the ecological aspect the electrochemical process of obtaining chromium coatings should be replaced by other technologies. The production of chromium coating involves as the main component of the bath chromium trioxide CrO3 which is very carcinogenic. Moreover the current efficiency of this process is very low what makes it very uneconomical in order to obtain coatings several μm thick. That is why the new method of obtaining the chromium and chromium nitride coating are searched. The new hybrid technology combining plasma nitriding and PACVD method with the use of metalorganic compounds could have the big practical aspect. This method can be applied for the details with complicated shapes. The paper presents the microstructure and useful properties like corrosion and wear resistance of chromium nitride layers produced by hybrid process which consists of first depositing of chromium coating by PAMOCVD method form liquid precursor 2‐ethylheksanoate chromium (III) and then annealing so obtained coating in nitrogen and hydrogen atmosphere using the glow discharge conditions.