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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Martinez, E.
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (12/12 displayed)
- 2023A quinary WTaCrVHf nanocrystalline refractory high-entropy alloy withholding extreme irradiation environmentscitations
- 2021Helium implantation damage resistance in nanocrystalline W-Ta-V-Cr high entropy alloyscitations
- 2020Radiation-induced segregation in W-Re: from kinetic Monte Carlo simulations to atom probe tomography experimentscitations
- 2018Magnetic properties and field-driven dynamics of chiral domain walls in epitaxial Pt/Co/AuxPt1-x trilayers
- 2018Role of the Sink Density in Non-Equilibrium Chemical Redistribution in Binary Alloyscitations
- 2018Role of the Sink Density in Non-Equilibrium Chemical Redistribution in Binary Alloyscitations
- 2017Progress update on lower length scale research and development on U3Si2 fuel and FeCrAl cladding
- 2017Effect of Li on the deformation mechanisms of nanocrystalline hexagonal close packed magnesiumcitations
- 2014Atomistic simulations of the decomposition kinetics in Fe-Cr alloys: Influence of magnetismcitations
- 2007Nanoembossed polymer substrates for biomedical surface interaction studies.citations
- 2006Influence of electron-beam and ultraviolet treatments on low-k porous dielectricscitations
- 2006Transparent micro- and nanopatterned poly(lactic acid) for biomedical applicationscitations
Places of action
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article
Influence of electron-beam and ultraviolet treatments on low-k porous dielectrics
Abstract
<jats:p>The down scaling of complementary metal oxide semiconductor transistors requires materials such as porous low-k dielectrics for advanced interconnects to reduce resistance-capacitance delay. After the deposition of the matrix and a sacrificial organic phase (porogen), postcuring treatments may be used to create porosity by evaporation of the porogen. In this paper, Auger electron spectroscopy is performed to simultaneously modify the material (e-beam cure) and measure the corresponding changes in structure and chemical composition. X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy measurements in attenuated total reflection mode confirm the Auger results. The porogen removal and matrix cross-linking result in the formation of a Si–O–Si network under e-beam or ultra violet cure. The possible degradation of these materials, even after cure, is mainly due the presence of Si–C bonds.</jats:p>