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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Song, Aimin M.
University of Manchester
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (4/4 displayed)
- 2018A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state densitycitations
- 2008Triarylamine polymers by microwave-assisted polycondensation for use in organic field-effect transistorscitations
- 2006Highly tunable, high-throughput nanolithography based on strained regioregular conducting polymer filmscitations
- 2006Combined optical and electrical studies of the effects of annealing on the intrinsic states and deep levels in a self-assembled InAs quantum-dot structurecitations
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article
Highly tunable, high-throughput nanolithography based on strained regioregular conducting polymer films
Abstract
Atomic force microscope (AFM) is now a standard imaging tool in laboratories but has displayed limited capability of nanolithography. We discover that an internal tensile strain exists in poly(3-hexylthiophene-2,5-diyl) (P3HT) films, and the physical effect is utilized to achieve highly tunable and high-throughput nanolithography. Trenches with widths spanning nearly two orders of magnitude from 40 nm to 2.3 μm are fabricated. We show that P3HT is also excellent for pattern transfer to inorganic materials. Furthermore, a lithography speed of 0.5 mm/s is achieved, which is a few orders of magnitude higher than other known methods of AFM-based nanolithography. © 2006 American Institute of Physics.