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Irene, E. A.
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Publications (6/6 displayed)
- 2007Multifunctional Nanocrystalline Thin Films of Er2O3: Interplay between Nucleation Kinetics and Film Characteristicscitations
- 2007Er2O3 as a high-K dielectric candidatecitations
- 2006Magnesium oxide as a candidate high-k gate dielectriccitations
- 2005ZrO2 film interfaces with Si and SiO2citations
- 2003Study of interface formation of (Ba,Sr)TiO3 thin films grown by rf sputter deposition on bare Si and thermal SiO2/Si substrates
- 2002Study of interface formation of (Ba,Sr)TiO3 thin films grown by rf sputter deposition on bare Si and thermal SiO2/Si substrates
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article
Magnesium oxide as a candidate high-k gate dielectric
Abstract
Magnesium oxide (MgO) thin films with sharp interfaces were deposited by sputtering of a Mg target on Si. The film stack was characterized using spectroscopic ellipsometry and transmission electron microscopy and the film static dielectric constant (kappa) and interface traps were determined. An amorphous SiO2 layer was found at the MgO/Si interface as a result of subcutaneous Si oxidation. kappa for the MgO films was found to be about twice that of SiO2, and the interface trap densities of MgO/Si were found to be comparable with SiO2/Si, rendering MgO competitive with all presently considered high-kappa dielectrics. (c) 2006 American Institute of Physics.