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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Koinuma, H.
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (17/17 displayed)
- 2005Improved stoichiometry and misfit control in perovskite thin film formation at a critical fluence by pulsed laser depositioncitations
- 2004High-resolution synchrotron-radiation photoemission characterization for atomically-controlled SrTiO3(001) substrate surfaces subjected to various surface treatmentscitations
- 2004Epitaxial growth and physical properties of a room temperature ferromagnetic semiconductor: Anatase phase Ti1−xCoxO2citations
- 2003A high-resolution synchrotron-radiation angle-resolved photoemission spectrometer with <i>in situ</i> oxide thin film growth capabilitycitations
- 2003Modeling and simulation of polycrystalline ZnO thin-film transistorscitations
- 2003Layer-by-layer growth of high-optical-quality ZnO film on atomically smooth and lattice relaxed ZnO buffer layercitations
- 200345° rotational epitaxy of SrTiO3 thin films on sulfide-buffered Sicitations
- 2003Experimental investigation of ferromagnetism in II-VI disordered semiconducting compoundscitations
- 2003Quantitative control and detection of heterovalent impurities in ZnO thin films grown by pulsed laser depositioncitations
- 2002Effect of MgZnO-layer capping on optical properties of ZnO epitaxial layerscitations
- 2002Vapor–liquid–solid tri-phase pulsed-laser epitaxy of RBa2Cu3O7−y single-crystal filmscitations
- 2002In-plane lattice constant tuning of an oxide substrate with Ba1−xSrxTiO3 and BaTiO3 buffer layerscitations
- 2002Systematic examination of carrier polarity in composition spread ZnO thin films codoped with Ga and Ncitations
- 2001Ferromagnetic interactions in p- and n-type II-VI diluted magnetic semiconductors
- 2001High-temperature goniometer for thin film growth and ion scattering studiescitations
- 2001Anatase TiO2 thin films grown on lattice-matched LaAlO3 substrate by laser molecular-beam epitaxycitations
- 2000In-plane anisotropic strain of ZnO closely packed microcrystallites grown on tilted (0001) sapphire
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article
Modeling and simulation of polycrystalline ZnO thin-film transistors
Abstract
<jats:p>Thin-film transistors (TFTs) made of transparent channel semiconductors such as ZnO are of great technological importance because their insensitivity to visible light makes device structures simple. In fact, there have been several demonstrations of ZnO TFTs achieving reasonably good field effect mobilities of 1–10 cm2/V s, but the overall performance of ZnO TFTs has not been satisfactory, probably due to the presence of dense grain boundaries. We modeled grain boundaries in ZnO TFTs and performed simulation of a ZnO TFT by using a two-dimensional device simulator in order to determine the grain boundary effects on device performance. Polycrystalline ZnO TFT modeling was started by considering a single grain boundary in the middle of the TFT channel, formulated with a Gaussian defect distribution localized in the grain boundary. A double Schottky barrier was formed in the grain boundary, and its barrier height was analyzed as a function of defect density and gate bias. The simulation was extended to TFTs with many grain boundaries to quantitatively analyze the potential profiles that developed along the channel. One of the main differences between a polycrystalline ZnO TFT and a polycrystalline Si TFT is that the much smaller nanoscaled grains in a polycrystalline ZnO TFT induces a strong overlap of the double Schottky barriers with a higher activation energy in the crystallite and a lower barrier potential in the grain boundary at subthreshold or off-state region of its transfer characteristics. Through the simulation, we were able to estimate the density of total trap states localized in the grain boundaries for polycrystalline ZnO TFT by determining the apparent mobility and grain size in the device.</jats:p>