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Motta, Antonella |
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Aziz, M. J.
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article
Synthesis of GaNxAs1-x thin films by pulsed laser melting and rapid thermal annealing of N+-implanted GaAs
Abstract
The preparation of GaN<sub>x</sub>As<sub>1-x</sub> thin films by pulsed laser melting and rapid thermal annealing of N<sup>+</sup>-implanted GaAs was described. The effects of N<sub>+</sub> implantation dose, rapid thermal annealing temperature and laser energy fluence on the N incorporation as well as structural and optical properties of these films were investigated. It was found that when the energy fluence of the pulsed laser was increased above the threshold, both the melt duration and melt depth increased.