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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Bertran, E.
Universitat de Barcelona
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (5/5 displayed)
- 2023Advancements in Plasma-Enhanced Chemical Vapor Deposition for Producing Vertical Graphene Nanowallscitations
- 2014Arc-Discharge Synthesis of Iron Encapsulated in Carbon Nanoparticles for Biomedical Applicationscitations
- 2006In-situ monitoring of laser annealing by micro-Raman spectroscopy for hydrogenated silicon nanoparticles produced in radio frequency glow dischargecitations
- 2002Calorimetry of hydrogen desorption from a-Si nanoparticlescitations
- 2001Enhancement of oxidation rate of a-Si nanoparticles during dehydrogenationcitations
Places of action
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article
Enhancement of oxidation rate of a-Si nanoparticles during dehydrogenation
Abstract
Oxidation of amorphous silicon (a-Si) nanoparticles grown by plasma-enhanced chemical vapor deposition were investigated. Their hydrogen content has a great influence on the oxidation rate at low temperature. When the mass gain is recorded during a heating ramp in dry air, an oxidation process at low temperature is identified with an onset around 250°C. This temperature onset is similar to that of hydrogen desorption. It is shown that the oxygen uptake during this process almost equals the number of hydrogen atoms present in the nanoparticles. To explain this correlation, we propose that oxidation at low temperature is triggered by the process of hydrogen desorption. © 2001 American Institute of Physics.