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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Goncalves, C.
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Topics
Publications (9/9 displayed)
- 2021Natural Benzo/Acetophenones as Leads for New Synthetic Acetophenone Hybrids Containing a 1,2,3-Triazole Ring as Potential Antifouling Agentscitations
- 2021Fabrication of biocompatible porous SAIB/silk fibroin scaffolds using ionic liquidscitations
- 2016Preparation and characterization of electrical conductive PVA based materials for peripheral nerve tube-guidescitations
- 2015Wetting behaviour of SAC305 solder on different substrates in high vacuum and inert atmospherecitations
- 2015Evaluation of biodegradable electric conductive tube-guides and mesenchymal stem cellscitations
- 2014In vitro anticoagulant and antioxidant performance of a marine sulfated polysaccharide
- 2014Unveiling the physicochemical properties of a sulfated polysaccharide based on Ulvan with high biomedical potential
- 2013TiAgx thin films for lower limb prosthesis pressure sensors: Effect of composition and structural changes on the electrical and thermal response of the filmscitations
- 2005Low-temperature deposition of weakly-stressed nanocrystalline silicon films by reactive magnetron sputteringcitations
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article
Low-temperature deposition of weakly-stressed nanocrystalline silicon films by reactive magnetron sputtering
Abstract
We discuss the fabrication and characterization of undoped hydrogenated and crystallized silicon thin films grown by reactive magnetron sputtering at growth rate of about 2 Å/s and at a temperature as low as 100 °C for various ratios of hydrogen dilution in the gas phase mixture (argon + x% hydrogen). Combined infrared absorption and Raman scattering spectroscopy techniques as well as conventional and high resolution transmission electron microscopy and stress measurements are used to fully characterize the films. In this temperature range, a minimum hydrogen dilution of 30% with respect to the plasma mixture (argon + hydrogen) is necessary to produce nanocrystalline films with crystalline volume fraction of about 65%. Moreover, these films are found to promote much lower stress intensity than those reported in previous works. The nature and strength of the stresses are dependent on the film microstructure....