Materials Map

Discover the materials research landscape. Find experts, partners, networks.

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The Materials Map is an open tool for improving networking and interdisciplinary exchange within materials research. It enables cross-database search for cooperation and network partners and discovering of the research landscape.

The dashboard provides detailed information about the selected scientist, e.g. publications. The dashboard can be filtered and shows the relationship to co-authors in different diagrams. In addition, a link is provided to find contact information.

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The Materials Map is still under development. In its current state, it is only based on one single data source and, thus, incomplete and contains duplicates. We are working on incorporating new open data sources like ORCID to improve the quality and the timeliness of our data. We will update Materials Map as soon as possible and kindly ask for your patience.

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in Cooperation with on an Cooperation-Score of 37%

Topics

Publications (3/3 displayed)

  • 2024AlN interlayer-induced reduction of dislocation density in the AlGaN epilayercitations
  • 2023Air-sensitive amplified spontaneous emission in lecithin-capped CsPbBr 3 nanocrystals thin films4citations
  • 2022Amplified spontaneous emission in thin films of quasi-2D BA3MA3Pb5Br16 lead halide perovskites9citations

Places of action

Chart of shared publication
Lomascolo, Mauro
3 / 7 shared
Tarantini, Iolena
1 / 2 shared
Esposito, Marco
1 / 8 shared
Tasco, Vittorianna
1 / 4 shared
Balestra, Gianluca
1 / 2 shared
Cuscunà, Massimo
1 / 2 shared
Lajaunie, Luc Cyrille Jacques
1 / 4 shared
Tobaldi, David Maria
1 / 5 shared
Passaseo, Adriana
1 / 3 shared
Bodnarchuk, Maryna I.
1 / 64 shared
Anni, Marco
2 / 17 shared
Andrusiv, Hordii
1 / 5 shared
Kovalenko, Maksym V.
1 / 195 shared
De Giorgi, Maria Luisa
2 / 12 shared
Qualtieri, Antonio
1 / 2 shared
Morello, Giovanni
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Milanese, Stefania
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Bolink, Henk
1 / 45 shared
La Placa, Maria-Grazia
1 / 5 shared
Boix, Pablo P.
1 / 19 shared
Chart of publication period
2024
2023
2022

Co-Authors (by relevance)

  • Lomascolo, Mauro
  • Tarantini, Iolena
  • Esposito, Marco
  • Tasco, Vittorianna
  • Balestra, Gianluca
  • Cuscunà, Massimo
  • Lajaunie, Luc Cyrille Jacques
  • Tobaldi, David Maria
  • Passaseo, Adriana
  • Bodnarchuk, Maryna I.
  • Anni, Marco
  • Andrusiv, Hordii
  • Kovalenko, Maksym V.
  • De Giorgi, Maria Luisa
  • Qualtieri, Antonio
  • Morello, Giovanni
  • Milanese, Stefania
  • Bolink, Henk
  • La Placa, Maria-Grazia
  • Boix, Pablo P.
OrganizationsLocationPeople

article

AlN interlayer-induced reduction of dislocation density in the AlGaN epilayer

  • Lomascolo, Mauro
  • Tarantini, Iolena
  • Esposito, Marco
  • Cretì, Arianna
  • Tasco, Vittorianna
  • Balestra, Gianluca
  • Cuscunà, Massimo
  • Lajaunie, Luc Cyrille Jacques
  • Tobaldi, David Maria
  • Passaseo, Adriana
Abstract

The emerging ultrawide-bandgap AlGaN alloy system holds promise for the development of advanced materials in the next generation of power semiconductor and UV optoelectronic devices. Within this context, heterostructures based on III-nitrides are very popular in view of their applications as electronic and optoelectronic components. AlGaN-based deep UV emitters are gaining visibility due to their disinfection capabilities. Likewise, high electron mobility transistors are attracting increasing attention owing to their superior electron transport which yields high-speed and high-power applications. These devices are conventionally made of AlGaN/GaN heterostructures grown on foreign substrates. However, structural defects, including stress induced by a mismatch in unit cell parameters and the presence of dislocations, can not only decrease the efficiency of the light emitters (by facilitating the non-radiative recombination of electron-hole pairs), but also impede electron mobility within the two-dimensional electron gas at the AlGaN/GaN interface. Therefore, the significance of obtaining high-quality AlGaN layers becomes evident. Including a thin AlN interlayer between the GaN buffer layer and AlGaN is a possible answer to address these drawbacks. Not only do we show that a thin AlN layer, approximately ≤3 nm in thickness, between the GaN buffer and AlGaN layers, is effective in decreasing the dislocation densities in the AlGaN layer by around 30%, but also this is responsible for an increase in the electron mobility (approximately 33%) compared to a classical AlGaN/GaN heterostructure. Additionally, the resulting heterostructure exhibits better optical quality, with a 7-fold increase in intensity as well as a 20% reduction in full-width at half-maximum in the AlGaN emission.

Topics
  • density
  • impedance spectroscopy
  • mobility
  • semiconductor
  • nitride
  • dislocation
  • two-dimensional