693.932 PEOPLE
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Casati, R. |
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| Kočí, Jan | Prague |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Sajavaara, Timo
University of Jyväskylä
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (55/55 displayed)
- 2024Enhancing electrocatalytic activity in metallic thin films through surface segregation of carboncitations
- 2024Ni Drastically Modifies the Microstructure and Electrochemistry of Thin Ti and Cr Layerscitations
- 2023Enhancing electrocatalytic activity in metallic thin films through surface segregation of carboncitations
- 2022Low-Temperature Atomic Layer Deposition of High-k SbOx for Thin Film Transistorscitations
- 2022Size dependent swift heavy ion induced Au nanoparticle elongation in SiO2 matrixcitations
- 2022Atomic Layer Deposition of Intermetallic Fe4Zn9 Thin Films from Diethyl Zinccitations
- 2022Spatial ALD of Al2O3 and ZnO using heavy watercitations
- 2022Atomic layer deposition of ternary ruthenates by combining metalorganic precursors with RuO4 as the co-reactantcitations
- 2022Structural and Optical Characterization of ZnS Ultrathin Films Prepared by Low-Temperature ALD from Diethylzinc and 1.5-Pentanedithiol after Various Annealing Treatments
- 2022Thermomechanical properties of aluminum oxide thin films made by atomic layer depositioncitations
- 2021Hydrogen and Deuterium Incorporation in ZnO Films Grown by Atomic Layer Depositioncitations
- 2021Atomic scale surface modification of TiO2 3D nano-arrays : plasma enhanced atomic layer deposition of NiO for photocatalysiscitations
- 2021Mechanical and optical properties of as-grown and thermally annealed titanium dioxide from titanium tetrachloride and water by atomic layer depositioncitations
- 2021What Determines the Electrochemical Properties of Nitrogenated Amorphous Carbon Thin Films?citations
- 2021Phosphites as precursors in atomic layer deposition thin film synthesiscitations
- 2020Ti Alloyed α-Ga2O3 : route towards Wide Band Gap Engineeringcitations
- 2020Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineeringcitations
- 2020Ti Alloyed α-Ga2O3: Route towards Wide Band Gap Engineering.
- 2020Ti Alloyed α -Ga 2 O 3: Route towards Wide Band Gap Engineering
- 2019Structural and optical characterization of ZnS ultrathin films prepared by low-temperature ALD from diethylzinc and 1.5-pentanedithiol after various annealing treatmentscitations
- 2019Room-Temperature Micropillar Growth of Lithium–Titanate–Carbon Composite Structures by Self-Biased Direct Current Magnetron Sputtering for Lithium Ion Microbatteriescitations
- 2018Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride filmscitations
- 2018Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride filmscitations
- 2018Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride filmscitations
- 2018High-quality superconducting titanium nitride thin film growth using infra-red pulsed laser depositioncitations
- 2018Properties of Atomic Layer Deposited Nanolaminates of Zirconium and Cobalt Oxidescitations
- 2018Atomic layer deposition of Ti-Nb-O thin films onto electrospun fibers for fibrous and tubular catalyst support structurescitations
- 2018Tribological properties of thin films made by atomic layer deposition sliding against siliconcitations
- 2017Stabilizing organic photocathodes by low-temperature atomic layer deposition of TiO<sub>2</sub>citations
- 2017Ozone-Based Atomic Layer Deposition of Al2O3 from Dimethylaluminum Chloride and Its Impact on Silicon Surface Passivationcitations
- 2017Room-temperature plasma-enhanced atomic layer deposition of ZnO : Film growth dependence on the PEALD reactor configurationcitations
- 2016Characterization and Electrochemical Properties of Oxygenated Amorphous Carbon (a-C) Filmscitations
- 2016Study of processing parameters on the mechanical and compositional properties of plasma-enhanced atomic layer deposition aluminum nitride films
- 2016Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride filmscitations
- 2016Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride filmscitations
- 2015Nanotribological, nanomechanical and interfacial characterization of Atomic Layer Deposited TiO2 on a silicon substratecitations
- 2015Atomic layer deposited lithium aluminum oxidecitations
- 2014Aluminum oxide from trimethylaluminum and water by atomic layer deposition:The temperature dependence of residual stress, elastic modulus, hardness and adhesioncitations
- 2013Atomic layer deposition of LixTiyOz thin filmscitations
- 2013ALD Al2O3 from TMA and water on Si: residual stress, elastic modulus, hardness and adhesion:residual stress, elastic modulus, hardness and adhesion
- 2013Studies on atomic layer deposition of MOF-5 thin filmscitations
- 2013Studies on atomic layer deposition of MOF-5 thin filmscitations
- 2013Variation of lattice constant and cluster formation in GaAsBicitations
- 2013ALD Al2O3 from TMA and water on Si: residual stress, elastic modulus, hardness and adhesion
- 2013Low temperature atomic layer deposition of noble metals using ozone and molecular hydrogen as reactantscitations
- 2012Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF(6) based plasmascitations
- 2012Plasma etch characteristics of aluminum nitride mask layers grown by low-temperature plasma enhanced atomic layer deposition in SF6 based plasmascitations
- 2011Corrosion Protection of Steel with Oxide Nanolaminates Grown by Atomic Layer Depositioncitations
- 2011Iridium metal and iridium oxide thin films grown by atomic layer deposition at low temperaturescitations
- 2011Controlling the crystallinity and roughness of atomic layer deposited titanium dioxide filmscitations
- 2011Atomic Layer Deposition and Characterization of Aluminum Silicate Thin Films for Optical Applicationscitations
- 2009Influence of Substrate Bias on the Structural and Dielectric Properties of Magnetron-Sputtered Ba x Sr 1-x TiO 3 Thin Films
- 2006Atomic layer deposition and properties of lanthanum oxide and lanthanum-aluminum oxide filmscitations
- 2005Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Filmscitations
- 2005Atomic layer deposition of hafnium dioxide thin films from hafnium tetrakis(dimethylamide) and watercitations
Places of action
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article
Enhancing electrocatalytic activity in metallic thin films through surface segregation of carbon
Abstract
Thin layers of commonly used adhesion metals i.e., Cr and Ti were annealed to investigate and estimate their impact on the electrochemical properties of the carbon nanomaterials grown on top of them. The microstructure, surface chemistry, and electrochemical activities of these materials were evaluated and compared with those of as-deposited thin films. The results from X-ray photoelectron spectroscopy (XPS), Raman spectroscopy, grazing incidence X-ray diffraction (GIXRD), time-of-flight elastic recoil detection analysis (TOF-ERDA), and conductive atomic force microscopy (C-AFM) indicated the formation of a catalytic graphite layer on Cr following annealing, while no such layer was formed on Ti. This is attributed to the formation of the Cr2O3 layer on annealed Cr, which acts as a barrier to carbon diffusion into the underlying Cr. Conversely, Ti exhibits a high solubility for both carbon and oxygen, preventing the formation of the graphite layer. Cyclic voltammetry results showed that annealed Cr electrodes are electrochemically active towards both dopamine (DA) and ascorbic acid (AA) while no electrochemical activity is exhibited by annealed Ti. Quantum chemical calculations suggested that the presence of carbon as graphene or an amorphous form is critical for the oxidation reaction of probes. These results are significant for comprehending how the distinct solubilities of typical interstitial solutes influence the microstructure of adhesion metal layers and consequently yield diverse electrochemical properties.