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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Bousquet, Angélique
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (8/8 displayed)
- 2023Comprehensive study of WSiC:H coatings synthesized by microwave-assisted RF reactive sputteringcitations
- 2023Reactive sputtering onto an ionic liquid, a new synthesis route for bismuth-based nanoparticlescitations
- 2021An investigation of adhesion mechanisms between plasma-treated PMMA support and aluminum thin films deposited by PVDcitations
- 2020Electrochromic Thin Films Based on NiAl Layered Double Hydroxide Nanoclusters for Smart Windows and Low-Power Displayscitations
- 2020SiCN:H thin films deposited by MW‐PECVD with liquid organosilicon precursor: Gas ratio influence versus properties of the depositscitations
- 2016In Situ Monitoring of Cu(In1-x,Gax)Se2 Composition and Target Poisoning by Real Time Optical Emission Spectroscopy During Deposition From a Hybrid Sputtering/Evaporation Process.citations
- 2015Multiphase Structure of Tantalum Oxynitride TaOxNy Thin Films Deposited by Reactive Magnetron Sputteringcitations
- 2014Structural and ellipsometric study on tailored optical properties of tantalum oxynitride films deposited by reactive sputteringcitations
Places of action
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article
Reactive sputtering onto an ionic liquid, a new synthesis route for bismuth-based nanoparticles
Abstract
<jats:p>The introduction of reactive gases during Bi target sputtering enables the reaction of radicals from plasma with Bi clusters at the IL surface before their solvation, leading to the formation of Bi or BiO<jats:sub><jats:italic>x</jats:italic></jats:sub>F<jats:sub><jats:italic>y</jats:italic></jats:sub> NPs depending on the Ar/O<jats:sub>2</jats:sub>/CF<jats:sub>4</jats:sub> mixtures.</jats:p>