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Anuar, Afiq
Martin Luther University Halle-Wittenberg
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article
Agglomeration enhancement of AlN surface diffusion fluxes on a (0 0 0 1)-sapphire substrate grown by pulsed atomic-layer epitaxy techniques via MOCVD
Abstract
<p>An atomically flat covering with a dense and crack-free surface of aluminium nitride films was successfully deposited on a sapphire-(0 0 0 1) substrate through a pulsed atomic-layer epitaxy technique <italic>via</italic> horizontal metalorganic chemical vapour deposition.</p>