| People | Locations | Statistics |
|---|---|---|
| Naji, M. |
| |
| Motta, Antonella |
| |
| Aletan, Dirar |
| |
| Mohamed, Tarek |
| |
| Ertürk, Emre |
| |
| Taccardi, Nicola |
| |
| Kononenko, Denys |
| |
| Petrov, R. H. | Madrid |
|
| Alshaaer, Mazen | Brussels |
|
| Bih, L. |
| |
| Casati, R. |
| |
| Muller, Hermance |
| |
| Kočí, Jan | Prague |
|
| Šuljagić, Marija |
| |
| Kalteremidou, Kalliopi-Artemi | Brussels |
|
| Azam, Siraj |
| |
| Ospanova, Alyiya |
| |
| Blanpain, Bart |
| |
| Ali, M. A. |
| |
| Popa, V. |
| |
| Rančić, M. |
| |
| Ollier, Nadège |
| |
| Azevedo, Nuno Monteiro |
| |
| Landes, Michael |
| |
| Rignanese, Gian-Marco |
|
Hämäläinen, Jani Marko Antero
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (20/20 displayed)
- 2020Van der Waals epitaxy of continuous thin films of 2D materials using atomic layer deposition in low temperature and low vacuum conditionscitations
- 2019How insignificant modifications of photocatalysts can significantly change their photocatalytic activitycitations
- 2018Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Depositioncitations
- 2018Atomic Layer Deposition of Rhenium Disulfidecitations
- 2016Atomic Layer Deposition of Metal Phosphates and Lithium Silicates
- 2016Atomic Layer Deposition of Iridium Thin Films Using Sequential Oxygen and Hydrogen Pulsescitations
- 2016Nucleation and conformality of iridium and iridium oxide thin films grown by atomic layer depositioncitations
- 2014Atomic Layer Deposition of Noble Metals and Their Oxidescitations
- 2013Low temperature atomic layer deposition of noble metals using ozone and molecular hydrogen as reactantscitations
- 2012Study of amorphous lithium silicate thin films grown by atomic layer depositioncitations
- 2012Lithium Phosphate Thin Films Grown by Atomic Layer Depositioncitations
- 2012Atomic layer deposited iridium oxide thin film as microelectrode coating in stem cell applicationscitations
- 2011Iridium metal and iridium oxide thin films grown by atomic layer deposition at low temperaturescitations
- 2011Atomic Layer Deposition and Characterization of Aluminum Silicate Thin Films for Optical Applicationscitations
- 2010pH electrode based on ALD deposited iridium oxidecitations
- 2009Metallic Ir, IrO2 and Pt Nanotubes and Fibers by Electrospinning and Atomic Layer Deposition
- 2009Study on atomic layer deposition of amorphous rhodium oxide thin filmscitations
- 2009Atomic layer deposition of iridium thin films by consecutive oxidation and reduction stepscitations
- 2008Atomic layer deposition of iridium oxide thin films from Ir(acac)₃ and ozonecitations
- 2008Atomic layer deposition of platinum oxide and metallic platinum thin films from Pt(acac)₂ and ozonecitations
Places of action
| Organizations | Location | People |
|---|
article
How insignificant modifications of photocatalysts can significantly change their photocatalytic activity
Abstract
<p>Synthetic procedures, including doping, sintering and surface coating, can noticeably affect the physicochemical properties of semiconductors. Introduced changes very often translate into photocatalytic and photoelectrochemical activity alterations. However, in this work we have focused on more subtle treatments, which result in lack of changes observed using XRD, UV-vis, porosimetry, TEM or SEM. We have subjected titanium dioxide (P25, UV100) to a treatment with reducing agents used in procedures of noble metal deposition (citrate, borohydride, and photoreduction), or surface decoration with small amounts of TiO2 by atomic layer deposition (ALD; 10 to 200 deposition cycles), which presumably should be neutral to its activity. Although the "classical" characterization methods did not show any differences between the original and treated samples, spectroelectrochemical (SE-DRS) determination of the density of states (DOS) and catechol adsorption tests revealed a significant influence of such treatments on the photocatalytic activity (photogeneration of HO radicals, water reduction, and herbicide degradation) and photoelectrochemical behaviour of the studied samples. We have shown that the applied slight surface modifications of titanium dioxide ("insignificant" at the first glance) may strongly affect the activity of this material. Such often overlooked effects must be taken into account during a comparative photoactivity analysis of various semiconductors, since an insignificant surface treatment may noticeably influence surface chemistry. We have also demonstrated that SE-DRS can be considered as a useful tool to study these effects, although it can be difficult to correlate a particular treatment with recorded changes in the density of states.</p>