• Kurmaev, Ernst Z.
• Leedahl, Brett D.
• Mcdermott, Eamon J. G.
• Cholakh, Seif O.
• Kukharenko, Andrey I.
• Nguyen, Van Luan
• Bazylewski, Paul F.
• Hunt, Adrian H.
• Lee, Young Hee
• Moewes, Alexander
• Blaha, Peter
• Bauer, Robert P. C.
• Chang, Gap Soo

Abstract

<jats:title>Abstract</jats:title><jats:p>This study reports a scalable and economical method to open a band gap in single layer graphene by deposition of cobalt metal on its surface using physical vapor deposition in high vacuum. At low cobalt thickness, clusters form at impurity sites on the graphene without etching or damaging the graphene. When exposed to oxygen at room temperature, oxygen functional groups form in proportion to the cobalt thickness that modify the graphene band structure. Cobalt/Graphene resulting from this treatment can support a band gap of 0.30 eV, while remaining largely undamaged to preserve its structural and electrical properties. A mechanism of cobalt-mediated band opening is proposed as a two-step process starting with charge transfer from metal to graphene, followed by formation of oxides where cobalt has been deposited. Contributions from the formation of both CoO and oxygen functional groups on graphene affect the electronic structure to open a band gap. This study demonstrates that cobalt-mediated oxidation is a viable method to introduce a band gap into graphene at room temperature that could be applicable in electronics applications.</jats:p>

Topics

• impedance spectroscopy
• surface
• cluster
• Oxygen
• physical vapor deposition
• etching
• cobalt
• band structure