Materials Map

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The Materials Map is an open tool for improving networking and interdisciplinary exchange within materials research. It enables cross-database search for cooperation and network partners and discovering of the research landscape.

The dashboard provides detailed information about the selected scientist, e.g. publications. The dashboard can be filtered and shows the relationship to co-authors in different diagrams. In addition, a link is provided to find contact information.

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The Materials Map is still under development. In its current state, it is only based on one single data source and, thus, incomplete and contains duplicates. We are working on incorporating new open data sources like ORCID to improve the quality and the timeliness of our data. We will update Materials Map as soon as possible and kindly ask for your patience.

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Publications (1/1 displayed)

  • 2022Multilayer redox-based HfOx/Al2O3/TiO2 memristive structures for neuromorphic computing15citations

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Ziegler, Martin
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Spetzler, Benjamin
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Park, Seongae
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2022

Co-Authors (by relevance)

  • Ziegler, Martin
  • Spetzler, Benjamin
  • Park, Seongae
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article

Multilayer redox-based HfOx/Al2O3/TiO2 memristive structures for neuromorphic computing

  • Ziegler, Martin
  • Spetzler, Benjamin
  • Park, Seongae
  • Ivanov, Tzvetan
Abstract

<jats:title>Abstract</jats:title><jats:p>Redox-based memristive devices have shown great potential for application in neuromorphic computing systems. However, the demands on the device characteristics depend on the implemented computational scheme and unifying the desired properties in one stable device is still challenging. Understanding how and to what extend the device characteristics can be tuned and stabilized is crucial for developing application specific designs. Here, we present memristive devices with a functional trilayer of HfO<jats:sub>x</jats:sub>/Al<jats:sub>2</jats:sub>O<jats:sub>3</jats:sub>/TiO<jats:sub>2</jats:sub> tailored by the stoichiometry of HfO<jats:sub>x</jats:sub> (<jats:italic>x</jats:italic> = 1.8, 2) and the operating conditions. The device properties are experimentally analyzed, and a physics-based device model is developed to provide a microscopic interpretation and explain the role of the Al<jats:sub>2</jats:sub>O<jats:sub>3</jats:sub> layer for a stable performance. Our results demonstrate that the resistive switching mechanism can be tuned from area type to filament type in the same device, which is well explained by the model: the Al<jats:sub>2</jats:sub>O<jats:sub>3</jats:sub> layer stabilizes the area-type switching mechanism by controlling the formation of oxygen vacancies at the Al<jats:sub>2</jats:sub>O<jats:sub>3</jats:sub>/HfO<jats:sub>x</jats:sub> interface with an estimated formation energy of ≈ 1.65 ± 0.05 eV. Such stabilized area-type devices combine multi-level analog switching, linear resistance change, and long retention times (≈ 10<jats:sup>7</jats:sup>–10<jats:sup>8</jats:sup> s) without external current compliance and initial electroforming cycles. This combination is a significant improvement compared to previous bilayer devices and makes the devices potentially interesting for future integration into memristive circuits for neuromorphic applications.</jats:p>

Topics
  • impedance spectroscopy
  • Oxygen