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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Ou, Haiyan
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (17/17 displayed)
- 2023Novel Photonic Applications of Silicon Carbidecitations
- 2017Effective optimization of surface passivation on porous silicon carbide using atomic layer deposited Al2O3citations
- 2017Effective optimization of surface passivation on porous silicon carbide using atomic layer deposited Al2O3citations
- 2017Low Temperature Photoluminescence of 6H fluorescent SiC
- 2016Electrically driven surface plasmon light-emitting diodes
- 2016Investigations of thin p-GaN light-emitting diodes with surface plasmon compatible metallization
- 2016Surface passivation of nano-textured fluorescent SiC by atomic layer deposited TiO2citations
- 2016Surface passivation of nano-textured fluorescent SiC by atomic layer deposited TiO2citations
- 2015A new type of white light-emitting diode light source basing on fluorescent SiC
- 2015A new type of white light-emitting diode light source basing on fluorescent SiC
- 2013Doping and stability of 3C-SiC: from thinfilm to bulk growth
- 2012Fluorescent SiC as a new material for white LEDscitations
- 2012Crystal growth and characterization of fluorescent SiC
- 2008Ge nanoclusters in PECVD-deposited glass caused only by heat treatmentcitations
- 2007Ge nanoclusters in PECVD-deposited glass after heat treating and electron irradiationcitations
- 2006Strained silicon as a new electro-optic materialcitations
- 2004GE NANOCLUSTERS IN PLANAR GLASS WAVEGUIDES DEPOSITED BY PECVD
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article
Strained silicon as a new electro-optic material
Abstract
For decades, silicon has been the material of choice for mass fabrication of electronics. This is in contrast to photonics, where passive optical components in silicon have only recently been realized1, 2. The slow progress within silicon optoelectronics, where electronic and optical functionalities can be integrated into monolithic components based on the versatile silicon platform, is due to the limited active optical properties of silicon3. Recently, however, a continuous-wave Raman silicon laser was demonstrated4; if an effective modulator could also be realized in silicon, data processing and transmission could potentially be performed by all-silicon electronic and optical components. Here we have discovered that a significant linear electro-optic effect is induced in silicon by breaking the crystal symmetry. The symmetry is broken by depositing a straining layer on top of a silicon waveguide, and the induced nonlinear coefficient, (2)15 pm V-1, makes it possible to realize a silicon electro-optic modulator. The strain-induced linear electro-optic effect may be used to remove a bottleneck5 in modern computers by replacing the electronic bus with a much faster optical alternative.