• Katzenstein, Joshua M.
• Janes, Dustin W.
• Prisco, Nathan A.
• Kim, Chae Bin
• Li, Zhenpeng
• Katsumata, Reika
• Blachut, Gregory

Abstract

<p>Coatings and substrates with topographically patterned features will play an important role in efficient technologies for harvesting and transmitting light energy. In order to address these applications, a methodology for prescribing height profiles in polymer films is presented here. This is accomplished by photochemcially patterning a solid-state, sensitized polymer film. After heating the film above its glass transition temperature, melt-state flow is triggered and directed by the chemical pattern. A second light exposure was applied to fully activate a heat-stable photo-crosslinking additive. The features formed here are thermochemically stable and can act as an underlayer in a multilayered film. To exemplify this capability, these films were also used to direct the macroscopic film morphology of a block copolymer overlayer.</p>

Topics

• impedance spectroscopy
• melt
• glass
• glass
• glass transition temperature
• copolymer
• block copolymer