| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Blachut, Gregory
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (7/7 displayed)
- 2020Spatial Control of the Self-assembled Block Copolymer Domain Orientation and Alignment on Photopatterned Surfacescitations
- 2017Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellaecitations
- 2017Generating Large Thermally Stable Marangoni-Driven Topography in Polymer Films by Stabilizing the Surface Energy Gradientcitations
- 2016A Hybrid Chemo-/Grapho-Epitaxial Alignment Strategy for Defect Reduction in Sub-10 nm Directed Self-Assembly of Silicon-Containing Block Copolymerscitations
- 2016Pattern Transfer of Sub-10 nm Features via Tin-Containing Block Copolymerscitations
- 2016Synthesis and characterization of Si-containing block co-polymers with resolution beyond 10 nmcitations
- 2014A photochemical approach to directing flow and stabilizing topography in polymer filmscitations
Places of action
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article
A photochemical approach to directing flow and stabilizing topography in polymer films
Abstract
<p>Coatings and substrates with topographically patterned features will play an important role in efficient technologies for harvesting and transmitting light energy. In order to address these applications, a methodology for prescribing height profiles in polymer films is presented here. This is accomplished by photochemcially patterning a solid-state, sensitized polymer film. After heating the film above its glass transition temperature, melt-state flow is triggered and directed by the chemical pattern. A second light exposure was applied to fully activate a heat-stable photo-crosslinking additive. The features formed here are thermochemically stable and can act as an underlayer in a multilayered film. To exemplify this capability, these films were also used to direct the macroscopic film morphology of a block copolymer overlayer.</p>